发明授权
- 专利标题: Extreme ultraviolet light source apparatus
- 专利标题(中): 极紫外光源设备
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申请号: US12605113申请日: 2009-10-23
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公开(公告)号: US07999241B2公开(公告)日: 2011-08-16
- 发明人: Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Tamotsu Abe
- 申请人: Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Tamotsu Abe
- 申请人地址: JP Tochigi
- 专利权人: Gigaphoton Inc.
- 当前专利权人: Gigaphoton Inc.
- 当前专利权人地址: JP Tochigi
- 代理机构: McDermott Will & Emery LLP
- 优先权: JP2008-273504 20081023; JP2009-242868 20091021
- 主分类号: G21K5/02
- IPC分类号: G21K5/02 ; H01J17/26
摘要:
An extreme ultraviolet light source apparatus has a magnetic field generator which generates a magnetic field region around a direction of the magnetic field passing through a plasma region in which a plasma is to be generated and converges charged particles including ion emitted from the plasma region toward the direction of the magnetic field, a first charged particle collector (receiver) mounted at both sides of an axis of the magnetic field in the magnetic field region in order to collect (receive) the charged particles converged by the magnetic field, a target supply unit supplying a target from a nozzle located outside a converging region in which the charged particles are to be converged inside the magnetic field region in an extreme ultraviolet light generating chamber, and a target collector located at a position opposite to the nozzle, the target retrieval portion retrieving a residual target which does not contribute to generation of the plasma.
公开/授权文献
- US20100140513A1 EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS 公开/授权日:2010-06-10
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