公开(公告)号：US20130215916A1

公开(公告)日：2013-08-22

申请号：US13590558

申请日：2012-08-21

Applicant: Kouji KAKIZAKI ,  Shinji OKAZAKI ,  Osamu WAKABAYASHI ,  Takashi ONOSE ,  Shinichi MATSUMOTO

Inventor： Kouji KAKIZAKI ,  Shinji OKAZAKI ,  Osamu WAKABAYASHI ,  Takashi ONOSE ,  Shinichi MATSUMOTO

IPC: H01S3/10 ,  H01S5/06

CPC classification number: H01S3/10 ,  H01S3/005 ,  H01S3/08004 ,  H01S3/08086 ,  H01S3/10092 ,  H01S3/1055 ,  H01S3/106 ,  H01S3/1625 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2325 ,  H01S3/235 ,  H01S3/2375 ,  H01S5/0092 ,  H01S5/0604 ,  H01S5/06216 ,  H01S5/4012 ,  H01S5/4087

Abstract: A laser apparatus includes a master oscillator capable of outputting a laser beam having a spectrum that includes at least three wavelength peaks, a multi-wavelength oscillation control mechanism capable of controlling energy of each of the wavelength peaks, a spectrum detecting unit that detects the spectrum of the above-mentioned laser beam, and a controller that controls the multi-wavelength oscillation control mechanism based on a detection result detected by the spectrum detecting unit.

Abstract translation: 激光装置包括能够输出具有包括至少三个波长峰值的光谱的激光束的主振荡器，能够控制每个波长峰值的能量的多波长振荡控制机构，检测频谱的频谱检测单元 以及控制器，其基于由所述频谱检测单元检测到的检测结果来控制所述多波长振荡控制机构。

公开(公告)号：US08471227B2

公开(公告)日：2013-06-25

申请号：US13293914

申请日：2011-11-10

Applicant: Kouji Kakizaki ,  Shinji Nagai ,  Tatsuya Yanagida

Inventor： Kouji Kakizaki ,  Shinji Nagai ,  Tatsuya Yanagida

IPC: G01N21/33 ,  G21K5/02 ,  H05H1/00

Abstract: An extreme ultraviolet light source apparatus in which a target material is irradiated with a laser beam and turned into plasma and extreme ultraviolet light is emitted from the plasma may include: a chamber in which the extreme ultraviolet light is generated; an electromagnetic field generation unit for generating at least one of an electric field and a magnetic field inside the chamber; and a cleaning unit for charging and separating debris adhered to an optical element inside the chamber.

公开(公告)号：US08238392B2

公开(公告)日：2012-08-07

申请号：US12710722

申请日：2010-02-23

Applicant: Yukio Watanabe ,  Hideyuki Hayashi ,  Kouji Kakizaki ,  Michio Shinozaki ,  Hideo Hoshino

Inventor： Yukio Watanabe ,  Hideyuki Hayashi ,  Kouji Kakizaki ,  Michio Shinozaki ,  Hideo Hoshino

IPC: H01S3/00 ,  H01S3/04 ,  H01S3/22 ,  H01S3/223

CPC classification number: H01S3/0407 ,  F25B2400/06 ,  F25D17/02 ,  H01S3/03 ,  H01S3/041 ,  H01S3/22

Abstract: A temperature controller for a gas laser which controls temperatures of a plurality of temperature-controlled apparatuses including a first temperature-controlled portion requiring a high-precision temperature-control and a second temperature-controlled portion requiring a low-precision temperature-control as compared with the first temperature-controlled portion and allowing a temperature-control with a low or high temperature as compared with the first temperature-controlled portion, comprises a first temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each first temperature-controlled portion, a second temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each second temperature-controlled portion, a first piping system connecting the first temperature control portion and each first temperature-controlled portion in parallel, and a second piping system connecting the second temperature control portion and each second temperature-controlled portion in parallel.

Abstract translation: 一种用于气体激光器的温度控制器，其控制多个温度控制装置的温度，包括需要高精度温度控制的第一温度控制部分和需要低精度温度控制的第二温度控制部分 与第一温度控制部分相比，第一温度控制部分与低温或高温的温度控制相比，包括产生冷却剂的第一温度控制部分或用于调节每个第一温度控制部分的温度的加热剂 温度控制部分，产生冷却剂的第二温度控制部分或用于调节每个第二温度控制部分的温度的加热剂，将第一温度控制部分和第一温度控制部分并联连接的第一管道系统， 以及连接第二回火的第二管道系统 所述控制部分和每个第二温度控制部分并联。

公开(公告)号：US20120119116A1

公开(公告)日：2012-05-17

申请号：US13293914

申请日：2011-11-10

Applicant: Kouji KAKIZAKI ,  Shinji NAGAI ,  Tatsuya YANAGIDA

Inventor： Kouji KAKIZAKI ,  Shinji NAGAI ,  Tatsuya YANAGIDA

IPC: G21K5/00

CPC classification number: G21K5/00 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

Abstract: An extreme ultraviolet light source apparatus in which a target material is irradiated with a laser beam and turned into plasma and extreme ultraviolet light is emitted from the plasma may include: a chamber in which the extreme ultraviolet light is generated; an electromagnetic field generation unit for generating at least one of an electric field and a magnetic field inside the chamber; and a cleaning unit for charging and separating debris adhered to an optical element inside the chamber.

Abstract translation: 从等离子体射出目标材料被照射激光并变成等离子体和极紫外光的极紫外光源装置可以包括：产生极紫外光的室; 电磁场产生单元，用于产生腔室内的电场和磁场中的至少一个; 以及用于对粘附到腔室内的光学元件的碎屑进行充填和分离的清洁单元。

公开(公告)号：US20120091893A1

公开(公告)日：2012-04-19

申请号：US13336749

申请日：2011-12-23

Applicant: Tatsuya YANAGIDA ,  Akira Endo ,  Hiroshi Komori ,  Shinji Nagai ,  Kouji Kakizaki ,  Tamotsu Abe ,  Hideo Hoshino

Inventor： Tatsuya YANAGIDA ,  Akira Endo ,  Hiroshi Komori ,  Shinji Nagai ,  Kouji Kakizaki ,  Tamotsu Abe ,  Hideo Hoshino

IPC: H05H1/46

CPC classification number: H05G2/003 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

Abstract: In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.

Abstract translation: 在EUV光源装置中，集光镜受到保护，不会损坏镜面涂层。 EUV光源装置包括：产生极紫外光的室; 目标供应单元，用于将目标材料供应到所述室中; 等离子体产生激光器单元，用于用等离子体产生激光束照射室内的目标材料以产生等离子体; 电离激光单元，用于用电离激光束照射在等离子体产生时产生的中性粒子，以将中性粒子转化为离子; 用于收集从等离子体辐射的极紫外光的收集镜; 以及用于在室内形成磁场或电场以捕获离子的磁场或电场形成单元。

公开(公告)号：US20110266467A1

公开(公告)日：2011-11-03

申请号：US13183217

申请日：2011-07-14

Applicant: Shinji NAGAI ,  Takanobu Ishihara ,  Kouji Kakizaki ,  Tamotsu Abe

Inventor： Shinji NAGAI ,  Takanobu Ishihara ,  Kouji Kakizaki ,  Tamotsu Abe

IPC: G21K5/02

CPC classification number: H05G2/003 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  H05G2/006 ,  H05G2/008

Abstract: An extreme ultraviolet light source apparatus has a magnetic field generator which generates a magnetic field region around a direction of the magnetic field passing through a plasma region in which a plasma is to be generated and converges charged particles including ion emitted from the plasma region toward the direction of the magnetic field, a first charged particle collector (receiver) mounted at both sides of an axis of the magnetic field in the magnetic field region in order to collect (receive) the charged particles converged by the magnetic field, a target supply unit supplying a target from a nozzle located outside a converging region in which the charged particles are to be converged inside the magnetic field region in an extreme ultraviolet light generating chamber, and a target collector located at a position opposite to the nozzle, the target retrieval portion retrieving a residual target which does not contribute to generation of the plasma.

Abstract translation: 极紫外光源装置具有磁场发生器，该磁场发生器在通过等离子体产生等离子体区域的磁场方向周围产生磁场区域，并将包含从等离子体区域射出的离子的带电粒子向着 磁场方向，安装在磁场区域的磁场轴的两侧的第一带电粒子收集器（接收器），以收集（接收）由磁场收敛的带电粒子;目标供给单元 从位于极紫外光发生室内的磁场区域内的会聚区域的会聚区域的喷嘴和位于与喷嘴相对的位置的目标集合体供给目标，目标取出部 检索对等离子体的产生无贡献的残留目标。

公开(公告)号：US07965756B2

公开(公告)日：2011-06-21

申请号：US12545495

申请日：2009-08-21

Applicant: Osamu Wakabayashi ,  Shinji Nagai ,  Kouji Kakizaki ,  Satoshi Tanaka

Inventor： Osamu Wakabayashi ,  Shinji Nagai ,  Kouji Kakizaki ,  Satoshi Tanaka

IPC: H01S3/22

CPC classification number: H01S3/005 ,  G02B1/02 ,  H01S3/0057 ,  H01S3/08009 ,  H01S3/08054 ,  H01S3/10061 ,  H01S3/2251

Abstract: At least either of the light entering plane or the light exiting plane is parallel to the (111) crystal face of the CaF2 crystal and the laser beam entering from the entering plane passes through the plane located between the [111] axis and the first azimuth axis in the locus of rotation of the [001] axis around the [111] axis and including the [111] axis and the first azimuth axis, the plane located between the [111] axis and the second azimuth axis in the locus of rotation of the [010] axis around the [111] axis and including the [111] axis and the second azimuth axis or the plane located between the [111] axis and the third azimuth axis in the locus of rotation of the [100] axis around the [111] axis and including the [111] axis and the third azimuth axis and exits from the exiting plane.

Abstract translation: 进入平面或出射平面的光中的至少任一个平行于CaF 2晶体的（111）晶面，并且从入射平面入射的激光束穿过位于[111]轴和第一方位角 [001]轴围绕[111]轴的旋转轨迹的轴线，包括[111]轴和第一方位轴，位于旋转轨迹中的[111]轴和第二方位角轴之间的平面 围绕[111]轴的[010]轴线，并且包括[111]轴和第二方位角轴或位于[111]轴和第三方位角之间的平面 围绕[111]轴并且包括[111]轴和第三方位角轴并从出射平面离开。

公开(公告)号：US20100294958A1

公开(公告)日：2010-11-25

申请号：US12783219

申请日：2010-05-19

Applicant: Hideyuki HAYASHI ,  Tooru Abe ,  Kouji Kakizaki ,  Toshihiro Nishisaka

Inventor： Hideyuki HAYASHI ,  Tooru Abe ,  Kouji Kakizaki ,  Toshihiro Nishisaka

IPC: H05G2/00

CPC classification number: H05G2/003 ,  H05G2/006

Abstract: An apparatus for measuring and controlling a target trajectory within a chamber apparatus for generating extreme ultraviolet light from plasma generated by irradiating a droplet target supplied from a target injection nozzle with a driver laser beam from an external driver laser. The apparatus includes: a nozzle adjustment mechanism for adjusting at least one of a position and an angle of the target injection nozzle; a target trajectory measuring unit for measuring a target trajectory to obtain trajectory information on the target trajectory; a target trajectory angle detecting unit for obtaining a value related to an angle deviation between the target trajectory represented by the trajectory information and a predetermined target trajectory; and a nozzle adjustment controller for controlling the nozzle adjustment mechanism based on the value related to the angle deviation such that the droplet target passes through a predetermined laser beam irradiation position.

Abstract translation: 一种用于测量和控制腔室装置内的目标轨迹的装置，用于通过用来自外部驱动器激光器的驱动器激光束照射从目标喷嘴提供的液滴目标产生的等离子体产生极紫外光。 该装置包括：用于调节目标喷嘴的位置和角度中的至少一个的喷嘴调节机构; 目标轨迹测量单元，用于测量目标轨迹以获得关于目标轨迹的轨迹信息; 目标轨迹角检测单元，用于获得与由所述轨迹信息表示的目标轨迹与预定目标轨迹之间的角度偏差相关的值; 以及喷嘴调节控制器，用于基于与角度偏差相关的值来控制喷嘴调节机构，使得液滴目标通过预定的激光束照射位置。

公开(公告)号：US20100054297A1

公开(公告)日：2010-03-04

申请号：US12545495

申请日：2009-08-21

Applicant: Osamu WAKABAYASHI ,  Shinji Nagai ,  Kouji Kakizaki ,  Satoshi Tanaka

Inventor： Osamu WAKABAYASHI ,  Shinji Nagai ,  Kouji Kakizaki ,  Satoshi Tanaka

IPC: H01S3/08

CPC classification number: H01S3/005 ,  G02B1/02 ,  H01S3/0057 ,  H01S3/08009 ,  H01S3/08054 ,  H01S3/10061 ,  H01S3/2251

Abstract: At least either of the light entering plane or the light exiting plane is parallel to the (111) crystal face of the CaF2 crystal and the laser beam entering from the entering plane passes through the plane located between the [111] axis and the first azimuth axis in the locus of rotation of the [001] axis around the [111] axis and including the [111] axis and the first azimuth axis, the plane located between the [111] axis and the second azimuth axis in the locus of rotation of the [010] axis around the [111] axis and including the [111] axis and the second azimuth axis or the plane located between the [111] axis and the third azimuth axis in the locus of rotation of the [100] axis around the [111] axis and including the [111] axis and the third azimuth axis and exits from the exiting plane.

Abstract translation: 进入平面或出射平面的光中的至少任一个平行于CaF 2晶体的（111）晶面，并且从入射平面入射的激光束穿过位于[111]轴和第一方位角 [001]轴围绕[111]轴的旋转轨迹的轴线，包括[111]轴和第一方位轴，位于旋转轨迹中的[111]轴和第二方位角轴之间的平面 围绕[111]轴的[010]轴线，并且包括[111]轴和第二方位角轴或位于[111]轴和第三方位角之间的平面 围绕[111]轴并且包括[111]轴和第三方位角轴并从出射平面离开。

公开(公告)号：US20100051832A1

公开(公告)日：2010-03-04

申请号：US12543582

申请日：2009-08-19

Applicant: Toshihiro NISHISAKA ,  Yukio WATANABE ,  Osamu WAKABAYASHI ,  Kouji KAKIZAKI ,  Michio SHINOZAKI

Inventor： Toshihiro NISHISAKA ,  Yukio WATANABE ,  Osamu WAKABAYASHI ,  Kouji KAKIZAKI ,  Michio SHINOZAKI

IPC: G21K5/04

CPC classification number: G03F7/70033 ,  G03F7/70975 ,  H05G2/00 ,  H05G2/003 ,  H05G2/008

Abstract: An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.

Abstract translation: EUV光源装置能够容易地进行EUV光源装置的维护，EUV光源装置能够容易地进行腔室或腔室的一部分的移动，到维护区域的移动以及相对于投影光学元件的高精度放置。 EUV光源装置是通过将激光束施加到室内的目标材料并且将从等离子体辐射的EUV光输入到曝光设备的投影光学器件中来产生等离子体的装置，并且包括用于定位腔室或维护的定位机构 在所述收集的极紫外光的光轴和所述曝光设备的投影光学元件的光轴对准的预定位置处的所述室的单元，以及用于将所述室或所述室的维护单元移动到所述室 预定位置和维护区域。