The present invention discloses an optical measurement and/or inspection device that, in one application, may be used for inspection of semiconductor devices. A method is disclosed for extracting information of a device-under-test for an ellipsometer, comprising the steps: providing a plurality of incoming polarized beams using a plurality of polarizers, where each of the beams being polarized at a designated polarizing angle; using a parabolic reflector to focus said plurality of incoming polarized beams on a spot on a DUT; using a parabolic reflector to collect a plurality of beams reflected from said DUT; and analyzing said collected beams using a plurality of analyzers, wherein each of the analyzers having a designated polarizing angle with respect to its respective polarizer.