发明授权
US08002511B2 Batch forming apparatus, substrate processing system, batch forming method, and storage medium
有权
分批成型装置,基板处理系统,分批成型方法和存储介质
- 专利标题: Batch forming apparatus, substrate processing system, batch forming method, and storage medium
- 专利标题(中): 分批成型装置,基板处理系统,分批成型方法和存储介质
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申请号: US11585337申请日: 2006-10-24
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公开(公告)号: US08002511B2公开(公告)日: 2011-08-23
- 发明人: Yuji Kamikawa , Koji Egashira
- 申请人: Yuji Kamikawa , Koji Egashira
- 申请人地址: JP Tokyo
- 专利权人: Tokyo Electron Limited
- 当前专利权人: Tokyo Electron Limited
- 当前专利权人地址: JP Tokyo
- 代理机构: Smith, Gambrell & Russell, LLP
- 优先权: JP2005-314409 20051028
- 主分类号: B65G49/07
- IPC分类号: B65G49/07
摘要:
A batch forming apparatus forms a batch of substrates by combining a plurality of substrates that have been taken out from a plurality of carriers each containing therein the substrates in a stacked manner. The batch forming apparatus includes: a substrate transfer mechanism that takes out the substrates from each carrier and transfer the substrates; a substrate relative positional relationship changing mechanism that rearranges one or more substrates out of the substrates transferred by the substrate transfer mechanism one by one relative to other substrates to change positional relationships of the substrates relative to each other; and a batch forming mechanism that forms a batch of substrates out of the substrates that have been transferred thereto by the substrate transfer mechanism, with positional relationships of the substrates having been changed relative to each other by the substrate relative positional relationship changing mechanism. A substrate processing system includes such a batch forming apparatus, and a substrate processing apparatus that process the batch of substrates formed by the batch forming apparatus.
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