发明授权
- 专利标题: Method and apparatus for inspecting pattern defects
- 专利标题(中): 检查图案缺陷的方法和装置
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申请号: US12876699申请日: 2010-09-07
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公开(公告)号: US08005292B2公开(公告)日: 2011-08-23
- 发明人: Kaoru Sakai , Shunji Maeda , Takafumi Okabe
- 申请人: Kaoru Sakai , Shunji Maeda , Takafumi Okabe
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP.
- 优先权: JP2003-390655 20031120
- 主分类号: G06K9/00
- IPC分类号: G06K9/00
摘要:
An apparatus for inspecting pattern defects, the apparatus including: an image acquisition unit which acquires an image of a specimen and stores the acquired image in an image memory; a defect candidate extraction unit which performs a defect candidate extraction process by using the acquired image, which is read from the image memory; and a defect detection unit which performs a defect detection process and a defect classification process based on a partial image containing a defect candidate that is extracted by the defect candidate extraction unit, wherein the processes performed by the defect detection unit is performed off-line asynchronously with an image acquisition process that is performed by the image acquisition unit.
公开/授权文献
- US20100328446A1 METHOD AND APPARATUS FOR INSPECTING PATTERN DEFECTS 公开/授权日:2010-12-30
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