公开(公告)号：US08090187B2

公开(公告)日：2012-01-03

申请号：US12725040

申请日：2010-03-16

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe ,  Hiroshi Goto ,  Masayuki Kuwabara ,  Naoya Takeuchi

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe ,  Hiroshi Goto ,  Masayuki Kuwabara ,  Naoya Takeuchi

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T7/0002 ,  G06T7/32 ,  G06T7/33 ,  G06T2207/30148

摘要： A pattern inspection method including: sequentially imaging plural chip formed on a substrate; selecting at least one of pattern sections of each inspection image obtained by the imaging, while discarding other pattern sections, based on a recipe created in advance, the recipe including information for determining which pattern sections to be selected or discarded; calculating position gap between an inspection image of a chip obtained by the imaging and a reference image stored in a memory by using positional information of pattern images included in the inspection image and reference pattern images which are both corresponding to the at least one of pattern sections selected at the selecting; aligning the inspection image and the reference image by using information of the calculated position gap; and comparing the aligned inspection image with the reference image, and extracting a difference between the two images as a defect candidate.

摘要翻译： 一种图案检查方法，包括：顺序成像形成在基板上的多个芯片; 选择通过成像获得的每个检查图像的图案部分中的至少一个，同时基于预先创建的食谱来丢弃其他图案部分，所述配方包括用于确定要选择或丢弃的图案部分的信息; 通过使用包括在检查图像中的图案图像的位置信息和对应于图案部分中的至少一个的参考图案图像来计算通过成像获得的芯片的检查图像与存储在存储器中的参考图像之间的位置间隙 选择选择; 通过使用计算出的位置间隙的信息对准检查图像和参考图像; 以及将对准的检查图像与参考图像进行比较，并且将两个图像之间的差提取为缺陷候选。

公开(公告)号：US07869966B2

公开(公告)日：2011-01-11

申请号：US10936501

申请日：2004-09-09

申请人： Takafumi Okabe ,  Shunji Maeda ,  Kaoru Sakai

发明人： Takafumi Okabe ,  Shunji Maeda ,  Kaoru Sakai

IPC分类号： G01N37/00

CPC分类号： G01N21/95607

摘要： The present invention relates to a tool for analyzing by priority a defect having a high possibility of causing an electrical failure when inspecting a particle and a pattern defect in a piece of work which constitutes an electronic device such as a semiconductor integrated circuit, and relates to a system therefor. On the basis of the result of comparison between defect information which is the result of inspection by an inspection tool and layout data stored in an auxiliary storage device, or on the basis of the result of reinspection by comparison between a defect and a wiring pattern as a background by an inspection processing operation unit, an object to be reviewed is selected using review conditions stored in the auxiliary storage device.

摘要翻译： 本发明涉及一种用于优先分析在检查构成诸如半导体集成电路之类的电子设备的工件中的颗粒和图案缺陷时引起电气故障的可能性高的缺陷的工具， 一个系统。 基于作为检查工具的检查结果的缺陷信息与存储在辅助存储装置中的布局数据之间的比较的结果，或者基于通过比较缺陷和布线图案之间的重新检查的结果， 通过检查处理操作单元的背景，使用存储在辅助存储装置中的检查条件来选择要检查的对象。

公开(公告)号：US07646477B2

公开(公告)日：2010-01-12

申请号：US11131379

申请日：2005-05-18

申请人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

发明人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

IPC分类号： G01N21/00

CPC分类号： G03F7/7065 ,  G01N21/95684

摘要： A pattern inspection apparatus includes a light source which emits ultraviolet light, an irradiator which reduces coherency of the ultraviolet light and irradiates the coherency reduced ultraviolet light onto a specimen on which a pattern is formed through an objective lens, and a focus control means which projects light on the specimen from outside the objective lens, detects light reflected from the specimen by the projection and adjusts a height of the specimen relative to the objective lens. The apparatus further includes an image which forms an image of the specimen irradiated with the ultraviolet light and detects the formed image with a sensor, an image processor which processes a signal outputted from the sensor to detect a defect of the specimen, and a display which displays information of the defect detected by the image processor.

摘要翻译： 图案检查装置包括发出紫外线的光源，减少紫外线的相干性并将相干性降低的紫外光照射到通过物镜形成图案的样本的照射器，以及投影 从物镜外部对样品进行光照射，通过投影检测从样品反射的光，并调整样本相对于物镜的高度。 该装置还包括形成用紫外线照射的样本的图像并用传感器检测形成的图像的图像，处理从传感器输出的信号以检测样本的缺陷的图像处理器，以及显示器 显示由图像处理器检测到的缺陷的信息。

公开(公告)号：US20090226076A1

公开(公告)日：2009-09-10

申请号：US12393859

申请日：2009-02-26

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T2207/30148

摘要： In a pattern inspection apparatus for comparing images of corresponding areas of two patterns, which are formed so as to be identical, so as to judge that a non-coincident part of the images is a defect, the influence of unevenness in brightness of patterns caused by a difference of thickness or the like is reduced, whereby highly sensitive pattern inspection is realized. In addition, high-speed pattern inspection can be carried out without changing the image comparison algorithm. For this purpose, the pattern inspection apparatus operates to perform comparison processing of images in parallel in plural areas. Further, the pattern inspection apparatus operates to convert gradation of an image signal among compared images using different plural processing units such that, even in the case in which a difference of brightness occurs in an identical pattern among images, a defect can be detected correctly.

摘要翻译： 在用于比较形成为相同的两个图案的相应区域的图像的图形检查装置中，以判断图像的不重合的部分是缺陷，导致图案的亮度不均匀性的影响 通过减小厚度差等，从而实现高灵敏度图案检查。 此外，可以进行高速图案检查，而不改变图像比较算法。 为此，图案检查装置在多个区域中并行地执行图像的比较处理。 此外，图案检查装置进行操作以使用不同的多个处理单元来转换比较图像中的图像信号的灰度，使得即使在图像中以相同图案发生亮度差异的情况下，也可以正确检测缺陷。

公开(公告)号：US07388979B2

公开(公告)日：2008-06-17

申请号：US10992759

申请日：2004-11-22

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G01N21/9501 ,  G01N21/95607 ,  G06T2207/30148

摘要： The present invention relates to a pattern defect inspection method and apparatus that reveal ultramicroscopic defects on an inspection target in which ultramicroscopic circuit patterns are formed, and inspect the defects with high sensitivity and at a high speed. The present invention provides a pattern inspection apparatus for comparing the images of corresponding areas of two formed patterns that should be identical with each other, and judging any mismatched image area as a defect. The pattern inspection apparatus includes means for performing an image comparison process on a plurality of areas in a parallel manner. Further, the pattern inspection apparatus also includes means for converting the gradation of the image signals of compared images in each of a plurality of different processes. Therefore, the present invention can properly detect defects even if the same patterns of compared images differ in brightness.

摘要翻译： 本发明涉及一种图案缺陷检查方法和装置，其在形成超微电路图案的检查对象上显露超显微缺陷，并以高灵敏度和高速检查缺陷。 本发明提供了一种图案检查装置，用于将两个形成的图案的相应区域的图像进行比较，该图形将彼此相同，并且将任何不匹配的图像区域判断为缺陷。 图案检查装置包括用于以并行方式对多个区域执行图像比较处理的装置。 此外，图案检查装置还包括用于在多个不同处理中的每一个中转换比较图像的图像信号的灰度的装置。 因此，即使相同的比较图像的图案的亮度不同，本发明也可以适当地检测缺陷。

公开(公告)号：US07372561B2

公开(公告)日：2008-05-13

申请号：US11139594

申请日：2005-05-31

申请人： Yukihiro Shibata ,  Shunji Maeda ,  Takafumi Okabe ,  Yoichi Takahara

发明人： Yukihiro Shibata ,  Shunji Maeda ,  Takafumi Okabe ,  Yoichi Takahara

IPC分类号： G01N21/00

CPC分类号： H01L21/67253 ,  G01N21/95607 ,  G01N2021/4792 ,  H01L21/67028 ,  H01L21/67057

摘要： The present invention relates to a high-sensitivity defect inspection method, apparatus, and system adapted for the fine-structuring of patterns; wherein, in addition to a cleaning tank which chemically cleans a sample and rinses the sample, a defect inspection apparatus having a liquid-immersion element by which the interspace between the sample and the objective lens of an optical system is filled with a liquid, and a drying tank which dries the sample, the invention uses liquid-immersion transfer means from said cleaning tank through said liquid-immersion means of said defect inspection apparatus to said drying tank so that the sample is transferred in a liquid-immersed state from said cleaning tank to said liquid-immersion means.

摘要翻译： 本发明涉及一种适用于精细构图的高灵敏度缺陷检查方法，装置和系统， 其特征在于，除了对样品进行化学清洗并冲洗样品的清洗槽以外，还具有具有液体浸渍元件的缺陷检查装置，通过该液浸元件将样品与光学系统的物镜之间的间隙填充液体， 干燥箱，干燥箱，将所述清洗槽的浸液转移装置通过所述缺陷检查装置的浸液装置使用于所述干燥箱，使样品以浸液状态从所述清洗 罐到所说的液浸装置。

公开(公告)号：US20070036422A1

公开(公告)日：2007-02-15

申请号：US11586203

申请日：2006-10-24

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G01N21/95607 ,  G03F1/84 ,  G06T7/32 ,  G06T2207/30148

摘要： The present invention provides a high-precision alignment method, device and code for inspections that compare an inspection image with a reference image and detect defects from their differences. In one embodiment an inspection image and a reference image are divided into multiple regions. An offset is calculated for each pair of sub-images. Out of these multiple offsets, only the offsets with high reliability are used to determine an offset for the entire image. This allows high-precision alignment with little or no dependency on pattern density or shape, differences in luminance between images, and uneven luminance within individual images. Also, detection sensitivity is adjusted as necessary by monitoring alignment precision.

摘要翻译： 本发明提供了一种用于检查的高精度对准方法，装置和代码，其将检查图像与参考图像进行比较，并从其差异中检测缺陷。 在一个实施例中，检查图像和参考图像被分成多个区域。 为每对子图像计算偏移量。 在这些多个偏移量中，仅使用具有高可靠性的偏移量来确定整个图像的偏移。 这允许对图案密度或形状几乎或不依赖的高精度对准，图像之间的亮度差异以及各个图像内的不均匀亮度。 此外，通过监视对准精度，根据需要调整检测灵敏度。

公开(公告)号：US20050264802A1

公开(公告)日：2005-12-01

申请号：US11139594

申请日：2005-05-31

申请人： Yukihiro Shibata ,  Shunji Maeda ,  Takafumi Okabe ,  Yoichi Takahara

发明人： Yukihiro Shibata ,  Shunji Maeda ,  Takafumi Okabe ,  Yoichi Takahara

IPC分类号： G01N21/88 ,  G01N21/956 ,  H01L21/00 ,  H01L21/66

CPC分类号： H01L21/67253 ,  G01N21/95607 ,  G01N2021/4792 ,  H01L21/67028 ,  H01L21/67057

摘要： The present invention relates to a high-sensitivity defect inspection method, apparatus, and system adapted for the fine-structuring of patterns; wherein, in addition to a cleaning tank which chemically cleans a sample and rinses the sample, a defect inspection apparatus having a liquid-immersion element by which the interspace between the sample and the objective lens of an optical system is filled with a liquid, and a drying tank which dries the sample, the invention uses liquid-immersion transfer means from said cleaning tank through said liquid-immersion means of said defect inspection apparatus to said drying tank so that the sample is transferred in a liquid-immersed state from said cleaning tank to said liquid-immersion means.

摘要翻译： 本发明涉及一种适用于精细构图的高灵敏度缺陷检查方法，装置和系统， 其特征在于，除了对样品进行化学清洗并冲洗样品的清洗槽以外，还具有具有液体浸渍元件的缺陷检查装置，通过该液浸元件将样品与光学系统的物镜之间的间隙填充液体， 干燥箱，干燥箱，将所述清洗槽的浸液转移装置通过所述缺陷检查装置的浸液装置使用于所述干燥箱，使样品以浸液状态从所述清洗 罐到所说的液浸装置。

公开(公告)号：US20050168730A1

公开(公告)日：2005-08-04

申请号：US11089881

申请日：2005-03-25

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe ,  Masahiro Watanabe

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe ,  Masahiro Watanabe

IPC分类号： G01B11/30 ,  G01B21/30 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  G01N23/04 ,  G01N23/06 ,  G01N23/225 ,  G01N23/227 ,  G06T1/00 ,  H01L21/66 ,  G01N21/00

CPC分类号： G01N23/227 ,  G01N21/94 ,  G01N21/9501

摘要： In a defect inspecting apparatus, having contrast, brightness and appearance of a target for inspection and detection sensitivity of a defect changed depending on optical system conditions, and adapted to perform inspection by selecting an optimal test condition, even an unskilled user can easily select an optimal optical condition by quantitatively displaying evaluation values side by side when optical system conditions are changed. Moreover, by selecting an evaluation item having highest satisfaction based on a result of a series of test inspection, an optimal test condition can be automatically selected.

公开(公告)号：US06900888B2

公开(公告)日：2005-05-31

申请号：US10650756

申请日：2003-08-29

申请人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

发明人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

IPC分类号： G01N21/956 ,  G03F7/20 ,  G03F9/00 ,  G01N21/88

CPC分类号： G03F7/7065 ,  G01N21/95684

摘要： The inventive method and apparatus for detecting defects of a microscopic circuit pattern by imaging the pattern at high resolution comprises an objective lens for imaging the subject pattern, a laser illumination means for illuminating the pupil of the objective lens, means of diminishing the coherency of the laser illumination, an accumulative detector, and means of processing the signal detected by the detector. The method and apparatus are capable of imaging the subject pattern at high sensitivity and high speed based on the illumination by a short wavelength, which is indispensable for the enhancement of resolution, particularly based on a laser light source which is advantageous for practicing, with a resulting image being the same or better in quality as compared with an image resulting from the ordinary discharge tube illumination, whereby it is possible to detect microscopic defects at high sensitivity.

摘要翻译： 用于通过以高分辨率对图案进行成像来检测微观电路图案的缺陷的本发明的方法和装置包括用于对被摄体图案进行成像的物镜，用于照射物镜的瞳孔的激光照明装置，降低该物镜的相干性的手段 激光照明，累积检测器，以及处理由检测器检测到的信号的装置。 该方法和装置能够以高灵敏度和高速度基于短波长的照明来对被摄体图案进行成像，这对于提高分辨率是不可或缺的，特别是基于有利于实践的激光光源 与普通放电管照明产生的图像相比，所得到的图像的质量相同或更好，从而可以以高灵敏度检测微观缺陷。