Invention Grant
- Patent Title: Semiconductor wafer analysis system
- Patent Title (中): 半导体晶圆分析系统
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Application No.: US11618360Application Date: 2006-12-29
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Publication No.: US08009895B2Publication Date: 2011-08-30
- Inventor: Chang-Huhn Lee , Seok-Woo Hong
- Applicant: Chang-Huhn Lee , Seok-Woo Hong
- Applicant Address: KR Suwon-Si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-Si
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2005-0133922 20051229
- Main IPC: G06K9/00
- IPC: G06K9/00

Abstract:
A semiconductor wafer analysis system is provided. In an embodiment, the semiconductor wafer analysis system includes a tester to test semiconductor wafers manufactured by at least one manufacturing facility, a wafer map generation module to generate wafer maps on the basis of the test results from the tester, and a wafer analysis module. The wafer analysis module may include a data generation module that divides each wafer map into a plurality of defect analysis regions and generates feature vectors representing the semiconductor wafers, and an operation module that statistically analyzes the feature vectors.
Public/Granted literature
- US20070211932A1 SEMICONDUCTOR WAFER ANALYSIS SYSTEM Public/Granted day:2007-09-13
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