Invention Grant
- Patent Title: Process for preparing photosensitive outer layer
- Patent Title (中): 光敏外层制备方法
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Application No.: US11900679Application Date: 2007-09-13
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Publication No.: US08017294B2Publication Date: 2011-09-13
- Inventor: John F. Yanus , Kenny-Tuan Dinh , Jin Wu , Dale S. Renfer
- Applicant: John F. Yanus , Kenny-Tuan Dinh , Jin Wu , Dale S. Renfer
- Applicant Address: US CT Norwalk
- Assignee: Xerox Corporation
- Current Assignee: Xerox Corporation
- Current Assignee Address: US CT Norwalk
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03G5/147
- IPC: G03G5/147

Abstract:
The presently disclosed embodiments are directed to an improved overcoat for an imaging member having a substrate, a charge transport layer, and an overcoat positioned on the charge transport layer, and a process for making the same including combining a resin having a reactive group selected from the group consisting of hydroxyl, carboxylic acid and amide groups, a melamine formaldehyde crosslinking agent, a crosslinkable fluoro additive, an acid catalyst, and a crosslinkable, alcohol-soluble charge transport molecule to form an overcoat solution, and subsequently providing the overcoat solution onto the charge transport layer to form an overcoat layer.
Public/Granted literature
- US20080003513A1 Process for preparing photosensitive outer layer Public/Granted day:2008-01-03
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