发明授权
US08017301B2 Photosensitive polymer, resist composition, and associated methods
有权
光敏聚合物,抗蚀剂组合物和相关方法
- 专利标题: Photosensitive polymer, resist composition, and associated methods
- 专利标题(中): 光敏聚合物,抗蚀剂组合物和相关方法
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申请号: US12314888申请日: 2008-12-18
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公开(公告)号: US08017301B2公开(公告)日: 2011-09-13
- 发明人: Sang-Jun Choi , Youn-Jin Cho , Seung-Wook Shin , Hye-Won Kim
- 申请人: Sang-Jun Choi , Youn-Jin Cho , Seung-Wook Shin , Hye-Won Kim
- 申请人地址: KR Gumi-si, Gyeongsangbuk-do
- 专利权人: Cheil Industries, Inc.
- 当前专利权人: Cheil Industries, Inc.
- 当前专利权人地址: KR Gumi-si, Gyeongsangbuk-do
- 代理机构: Lee & Morse, P.C.
- 优先权: KR10-2007-0133685 20071218
- 主分类号: G03F7/004
- IPC分类号: G03F7/004 ; G03F7/30
摘要:
A photosensitive polymer, the photosensitive polymer including repeating units represented by Formulae 1 to 3: wherein R1 and R3 are independently hydrogen or methyl, R2 is a C4 to C20 acid-labile group, R4 is a lactone-derived group, AR is a substituted or unsubstituted phenyl ring, or a substituted or unsubstituted aryl having from two to three fused aromatic rings, carbon CAR is bonded directly to an aromatic ring of AR, l, m, and n are positive integers, l/(l+m+n) is about 0.1 to about 0.5, m/(l+m+n) is about 0.3 to about 0.5, and n/(l+m+n) is about 0.1 to 0.4.
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