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11 条记录 (耗时 0.017 秒)

    Photoresist composition with high etching resistance
    1.
    发明申请
    Photoresist composition with high etching resistance 审中-公开
    具有高抗蚀性的光刻胶组合物

    公开(公告)号：US20100239982A1

    公开(公告)日：2010-09-23

    申请号：US12801146

    申请日：2010-05-25

    申请人： Sang-Jun Choi ,  Youn-Jin Cho ,  Seung-Wook Shin ,  Hye-Won Kim

    发明人： Sang-Jun Choi ,  Youn-Jin Cho ,  Seung-Wook Shin ,  Hye-Won Kim

    IPC分类号： G03F7/004

    CPC分类号： G03F7/0397

    摘要： A resist composition includes a first polymer including a repeating unit having the following Chemical Formula 1 and a repeating unit having the following Chemical Formula 2, a second polymer including a repeating unit having the following Chemical Formula 3, a repeating unit having the following Chemical Formula 4, and a repeating unit having the following Chemical Formula 5, a photoacid generator, and a solvent.

    摘要翻译： 抗蚀剂组合物包括包含具有以下化学式1的重复单元和具有以下化学式2的重复单元的第一聚合物，包含具有以下化学式3的重复单元的第二聚合物，具有以下化学式的重复单元 4和具有以下化学式5的重复单元，光酸产生剂和溶剂。

    Aromatic (meth)acrylate compound having an alpha-hydroxy, photosensitive polymer, resist compositions, and associated methods
    2.
    发明申请
    Aromatic (meth)acrylate compound having an alpha-hydroxy, photosensitive polymer, resist compositions, and associated methods 审中-公开
    具有α-羟基，光敏聚合物，抗蚀剂组合物和相关方法的芳族（甲基）丙烯酸酯化合物

    公开(公告)号：US20090155719A1

    公开(公告)日：2009-06-18

    申请号：US12314880

    申请日：2008-12-18

    申请人： Sang-Jun Choi ,  Youn-Jin Cho ,  Seung-Wook Shin ,  Hye-Won Kim

    发明人： Sang-Jun Choi ,  Youn-Jin Cho ,  Seung-Wook Shin ,  Hye-Won Kim

    IPC分类号： G03F7/004 ,  C07C69/54 ,  G03F7/20 ,  C08F24/00

    CPC分类号： C07C69/54 ,  C07C2603/24 ,  G03F7/0397

    摘要： An aromatic (meth)acrylate compound having an α-hydroxy, the aromatic (meth)acrylate compound being represented by the following Formula 1: In Formula 1, R1 is hydrogen or a methyl, R2 is hydrogen, a substituted or unsubstituted alkyl, or a substituted or unsubstituted aryl, AR is a substituted or unsubstituted phenyl ring, or a substituted or unsubstituted aryl having from two to three fused aromatic rings, and carbon CAR is bonded directly to an aromatic ring of AR, R and R′ are independently hydrogen or an alkyl, and X is an integer ranging from 1 to 6.

    摘要翻译： 具有α-羟基的芳族（甲基）丙烯酸酯化合物，芳族（甲基）丙烯酸酯化合物由下式1表示：在式1中，R 1是氢或甲基，R 2是氢，取代或未取代的烷基或 取代或未取代的芳基，AR是取代或未取代的苯环，或具有2至3个稠合芳环的取代或未取代的芳基，碳CAR直接键合到AR的芳香环上，R和R'独立地是氢 或烷基，X为1〜6的整数。

    Photosensitive polymer, resist composition, and associated methods
    4.
    发明授权
    Photosensitive polymer, resist composition, and associated methods 有权
    光敏聚合物，抗蚀剂组合物和相关方法

    公开(公告)号：US08017301B2

    公开(公告)日：2011-09-13

    申请号：US12314888

    申请日：2008-12-18

    申请人： Sang-Jun Choi ,  Youn-Jin Cho ,  Seung-Wook Shin ,  Hye-Won Kim

    发明人： Sang-Jun Choi ,  Youn-Jin Cho ,  Seung-Wook Shin ,  Hye-Won Kim

    IPC分类号： G03F7/004 ,  G03F7/30

    CPC分类号： G03F7/0397 ,  C08F24/00 ,  Y10S430/106 ,  Y10S430/111

    摘要： A photosensitive polymer, the photosensitive polymer including repeating units represented by Formulae 1 to 3: wherein R1 and R3 are independently hydrogen or methyl, R2 is a C4 to C20 acid-labile group, R4 is a lactone-derived group, AR is a substituted or unsubstituted phenyl ring, or a substituted or unsubstituted aryl having from two to three fused aromatic rings, carbon CAR is bonded directly to an aromatic ring of AR, l, m, and n are positive integers, l/(l+m+n) is about 0.1 to about 0.5, m/(l+m+n) is about 0.3 to about 0.5, and n/(l+m+n) is about 0.1 to 0.4.

    摘要翻译： 光敏聚合物，其包含由式1至3表示的重复单元：其中R1和R3独立地为氢或甲基，R2为C4至C20酸不稳定基团，R4为内酯衍生基团，AR为取代基 或未取代的苯环，或具有2至3个稠合芳环的取代或未取代的芳基，碳CAR直接键合到芳族环，AR，l，m和n均为正整数，l /（1 + m + n ）为约0.1至约0.5，m /（1 + m + n）为约0.3至约0.5，并且n /（1 + m + n）为约0.1至0.4。

    Photosensitive polymer, resist composition, and associated methods
    8.
    发明申请
    Photosensitive polymer, resist composition, and associated methods 有权
    光敏聚合物，抗蚀剂组合物和相关方法

    公开(公告)号：US20090155720A1

    公开(公告)日：2009-06-18

    申请号：US12314888

    申请日：2008-12-18

    申请人： Sang-Jun Choi ,  Youn-Jin Cho ,  Seung-Wook Shin ,  Hye-Won Kim

    发明人： Sang-Jun Choi ,  Youn-Jin Cho ,  Seung-Wook Shin ,  Hye-Won Kim

    IPC分类号： G03F7/004 ,  C08F24/00 ,  G03F7/20

    CPC分类号： G03F7/0397 ,  C08F24/00 ,  Y10S430/106 ,  Y10S430/111

    摘要： A photosensitive polymer, the photosensitive polymer including repeating units represented by Formulae 1 to 3: wherein R1 and R3 are independently hydrogen or methyl, R2 is a C4 to C20 acid-labile group, R4 is a lactone-derived group, AR is a substituted or unsubstituted phenyl ring, or a substituted or unsubstituted aryl having from two to three fused aromatic rings, carbon CAR is bonded directly to an aromatic ring of AR, l, m, and n are positive integers, 1/(l+m+n) is about 0.1 to about 0.5, m/(l+m+n) is about 0.3 to about 0.5, and n/(l+m+n) is about 0.1 to 0.4.

    摘要翻译： 光敏聚合物，其包含由式1至3表示的重复单元：其中R1和R3独立地为氢或甲基，R2为C4至C20酸不稳定基团，R4为内酯衍生基团，AR为取代基 或未取代的苯环，或具有2至3个稠合芳环的取代或未取代的芳基，碳CAR直接键合到芳族环，AR，l，m和n均为正整数，1 /（1 + m + n ）为约0.1至约0.5，m /（1 + m + n）为约0.3至约0.5，并且n /（1 + m + n）为约0.1至0.4。