发明授权
US08018592B2 Optical system for a particle analyzer and particle analyzer using same
有权
用于粒子分析仪的光学系统和使用它的粒子分析仪
- 专利标题: Optical system for a particle analyzer and particle analyzer using same
- 专利标题(中): 用于粒子分析仪的光学系统和使用它的粒子分析仪
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申请号: US12720201申请日: 2010-03-09
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公开(公告)号: US08018592B2公开(公告)日: 2011-09-13
- 发明人: Seiichiro Tabata
- 申请人: Seiichiro Tabata
- 申请人地址: JP Kobe
- 专利权人: Sysmex Corporation
- 当前专利权人: Sysmex Corporation
- 当前专利权人地址: JP Kobe
- 代理机构: Brinks Hofer Gilson & Lione
- 优先权: JP2006-209263 20060731
- 主分类号: G01N21/00
- IPC分类号: G01N21/00 ; G01N33/48
摘要:
A compact optical system for a particle analyzer and particle analyzer using same are provided. The optical system for a particle analyzer of the present invention comprises a light source, an irradiation optical system for irradiating particles passing through a flow cell with light from the light source, a photodetector for receiving the scattered light from the particles, a light shielding member for blocking the direct light from the light source from impinging the photodetector, and a detecting lens for directing the scattered light toward the photodetector, wherein the irradiation optical system forms a first focus that focuses the light from the light source on the particle passing through the flow cell, and forms a second focus that focuses the light from the light source at a position between the detecting lens and photodetector, and disposes the light shielding member at the position of the second focus.
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