发明授权
- 专利标题: Tunnel magnetic resistance effect memory
- 专利标题(中): 隧道磁阻效应记忆
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申请号: US12817327申请日: 2010-06-17
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公开(公告)号: US08018759B2公开(公告)日: 2011-09-13
- 发明人: Hiroshi Kano , Yutaka Higo , Tetsuya Yamamoto , Hiroyuki Ohmori , Masanori Hosomi , Shinichiro Kusunoki , Yuki Oishi , Kazutaka Yamane , Kazuhiro Bessho , Minoru Ikarashi
- 申请人: Hiroshi Kano , Yutaka Higo , Tetsuya Yamamoto , Hiroyuki Ohmori , Masanori Hosomi , Shinichiro Kusunoki , Yuki Oishi , Kazutaka Yamane , Kazuhiro Bessho , Minoru Ikarashi
- 申请人地址: JP Tokyo
- 专利权人: Sony Corporation
- 当前专利权人: Sony Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: K&L Gates LLP
- 优先权: JPP2009-151515 20090625
- 主分类号: G11C11/00
- IPC分类号: G11C11/00
摘要:
A memory includes: a plurality of memory devices, each including a tunnel magnetic resistance effect device containing a magnetization free layer in which a direction of magnetization can be reversed, a tunnel barrier layer including an insulating material, and a magnetization fixed layer provided with respect to the magnetization free layer via the tunnel barrier layer with a fixed direction of magnetization; a random access memory area in which information is recorded using the direction of magnetization of the magnetization free layer of the memory device; and a read only memory area in which information is recorded depending on whether there is breakdown of the tunnel barrier layer of the memory device or not.
公开/授权文献
- US20100328992A1 MEMORY 公开/授权日:2010-12-30
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