发明授权
US08021564B2 Method for detecting an end point of resist peeling, method and apparatus for peeling resist, and computer-readable storage medium
有权
用于检测抗蚀剂剥离终点的方法,用于剥离抗蚀剂的方法和装置以及计算机可读存储介质
- 专利标题: Method for detecting an end point of resist peeling, method and apparatus for peeling resist, and computer-readable storage medium
- 专利标题(中): 用于检测抗蚀剂剥离终点的方法,用于剥离抗蚀剂的方法和装置以及计算机可读存储介质
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申请号: US11868045申请日: 2007-10-05
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公开(公告)号: US08021564B2公开(公告)日: 2011-09-20
- 发明人: Isamu Sakuragi , Kazuhiro Kubota
- 申请人: Isamu Sakuragi , Kazuhiro Kubota
- 申请人地址: JP Tokyo
- 专利权人: Tokyo Electron Limited
- 当前专利权人: Tokyo Electron Limited
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2006-275404 20061006
- 主分类号: G01L21/30
- IPC分类号: G01L21/30
摘要:
A method for detecting an end point of a resist peeling process in which a resist is gasified to be peeled off by producing hydrogen radicals by catalytic cracking reaction where a hydrogen-containing gas contacts with a high-temperature catalyst, and contacting the produced hydrogen radicals with a resist on a substrate, includes monitoring one or more parameters indicating a state of the catalyst and detecting the end point of the resist peeling process based on variations of the monitored parameters. The hydrogen-containing gas may be a H2 gas. The parameters indicating the state of the catalyst may be one or more electrical parameters when a power is supplied to the catalyst. Further, the catalyst may be a filament made of a high melting point metal.
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