发明授权
US08027089B2 Minute structure and its manufacturing method 有权
分钟结构及其制造方法

  • 专利标题: Minute structure and its manufacturing method
  • 专利标题(中): 分钟结构及其制造方法
  • 申请号: US11992987
    申请日: 2006-10-02
  • 公开(公告)号: US08027089B2
    公开(公告)日: 2011-09-27
  • 发明人: Masatoshi Hayashi
  • 申请人: Masatoshi Hayashi
  • 申请人地址: JP Tokyo
  • 专利权人: Nikon Corporation
  • 当前专利权人: Nikon Corporation
  • 当前专利权人地址: JP Tokyo
  • 代理机构: Oliff & Berridge, PLC
  • 优先权: JP2005-295490 20051007
  • 国际申请: PCT/JP2006/319718 WO 20061002
  • 国际公布: WO2007/043383 WO 20070419
  • 主分类号: G02B5/18
  • IPC分类号: G02B5/18
Minute structure and its manufacturing method
摘要:
A manufacturing method of a minute structure having fine structures on opposing inner surfaces, includes the steps of forming a first pattern in a surface of a first layer, forming a sacrificial layer on the patterned surface of the first layer, forming a second pattern on a surface of the sacrificial layer, forming a second layer on the sacrificial layer and a portion of the surface of the first layer, and removing a member constituting the sacrificial layer. In the step of forming the first pattern on the first layer and the step of forming the second pattern on the sacrificial layer, the patterns are formed using the same alignment marks as references. This manufacturing method can realize highly accurate alignment even when plural lenses or DOEs are used.
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