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US08028722B2 Fluid handling device with directionally-biased wetting surface 失效
具有方向偏置润湿表面的流体处理装置

Fluid handling device with directionally-biased wetting surface
Abstract:
A fluid handling device with an anisotropic wetting surface including a substrate with a multiplicity of asymmetric substantially uniformly shaped asperities thereon. Each asperity has a first asperity rise angle and a second asperity rise angle relative to the substrate. The asperities are structured to present a desired retentive force ratio (f1/f2) greater or less than unity caused by asymmetry between the first asperity rise angle and the second asperity rise angle according to the formula: f3/f2=sin(ω3+½Δθ0)/sin(ω2+½Δθ0).
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