Invention Grant
- Patent Title: Method for producing high-purity quaternary ammonium salt
- Patent Title (中): 生产高纯度季铵盐的方法
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Application No.: US12311067Application Date: 2007-09-18
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Publication No.: US08029689B2Publication Date: 2011-10-04
- Inventor: Tetsuo Nishida , Kazutaka Hirano , Akinori Oka , Yoshinobu Abe , Akihiro Nabeshima
- Applicant: Tetsuo Nishida , Kazutaka Hirano , Akinori Oka , Yoshinobu Abe , Akihiro Nabeshima
- Applicant Address: JP Osaka JP Osaka
- Assignee: Otsuka Chemical Co., Ltd.,Stella Chemifa Corporation
- Current Assignee: Otsuka Chemical Co., Ltd.,Stella Chemifa Corporation
- Current Assignee Address: JP Osaka JP Osaka
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2006-252229 20060919
- International Application: PCT/JP2007/068596 WO 20070918
- International Announcement: WO2008/035796 WO 20080327
- Main IPC: H01G9/02
- IPC: H01G9/02 ; C07C209/00

Abstract:
A process for preparing a high-purity quaternary ammonium salt comprising: (1) adding an oxide or hydroxide of a Group 1, 2, 12 or 13 metal to a quaternary ammonium salt containing a protonic acid salt of a tertiary amine as an impurity and thereby neutralizing the tertiary amine protonic acid salt with the metal oxide or hydroxide to convert the acid salt to a tertiary amine and water and to convert the metal oxide or hydroxide to a metal salt at the same time, and (2) removing the tertiary amine, water and metal salt produced from the system.
Public/Granted literature
- US20100044617A1 Method for producing high-purity quaternary ammonium salt Public/Granted day:2010-02-25
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