发明授权
- 专利标题: Method for manufacturing a semiconductor device
- 专利标题(中): 半导体器件的制造方法
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申请号: US12836142申请日: 2010-07-14
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公开(公告)号: US08035077B2公开(公告)日: 2011-10-11
- 发明人: Shunpei Yamazaki , Atsushi Hirose , Koji Ono , Hotaka Maruyama
- 申请人: Shunpei Yamazaki , Atsushi Hirose , Koji Ono , Hotaka Maruyama
- 申请人地址: JP Kanagawa-ken
- 专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址: JP Kanagawa-ken
- 代理机构: Fish & Richardson P.C.
- 优先权: JP2007-073186 20070320
- 主分类号: H01L31/18
- IPC分类号: H01L31/18
摘要:
A semiconductor device is manufactured through steps in which a photoelectric conversion element and an amplifier circuit are formed over a first substrate with a release layer interposed therebetween, and the photoelectric conversion element and the amplifier circuit are separated from the first substrate. Output characteristics of the amplifier circuit are improved and the semiconductor device with high reliability is obtained. A manufacturing method of such semiconductor device includes steps of forming a metal layer having an opening portion over a substrate, forming an insulating layer over the entire surface of the substrate including the opening portion and the metal layer, forming a photoelectric conversion layer in a region which overlaps with the metal layer and is a layer over the insulating layer, forming an amplifier circuit, which amplifies an output current of the photoelectric conversion element by using a thin film transistor, in the opening portion in the metal layer, forming a protective layer over the photoelectric conversion element and the amplifier circuit, and separating the photoelectric conversion element and the amplifier circuit, together with the insulating layer, from the substrate through laser irradiation to the metal layer.
公开/授权文献
- US20100282947A1 METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE 公开/授权日:2010-11-11
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