发明授权
- 专利标题: Methods for defining evaluation points for optical proximity correction and optical proximity correction methods including same
- 专利标题(中): 用于定义光学邻近校正的评估点的方法和包括其的光学邻近校正方法
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申请号: US12174171申请日: 2008-07-16
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公开(公告)号: US08037446B2公开(公告)日: 2011-10-11
- 发明人: John R. C. Futrell , Ezequiel Vidal Russell , William A. Stanton
- 申请人: John R. C. Futrell , Ezequiel Vidal Russell , William A. Stanton
- 申请人地址: US ID Boise
- 专利权人: Micron Technology, Inc.
- 当前专利权人: Micron Technology, Inc.
- 当前专利权人地址: US ID Boise
- 代理机构: TraskBritt
- 主分类号: G06F17/50
- IPC分类号: G06F17/50
摘要:
Methods are disclosed for defining evaluation points for use in optical proximity correction of a rectangular target geometry. A method for defining evaluation points for use in optical proximity correction of a rectangular target geometry may comprise predicting a contour of an image to be produced in an optical proximity correction simulation of a target geometry. The target geometry may comprise a plurality of line segments, each line segment of the plurality having one evaluation point defined thereon. The method may further comprise shifting at least one evaluation point to an associated point on the predicted contour of the image.
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