发明授权
US08037727B2 Non-planar sputter targets having crystallographic orientations promoting uniform deposition 失效
具有促进均匀沉积的晶体取向的非平面溅射靶

Non-planar sputter targets having crystallographic orientations promoting uniform deposition
摘要:
A non-planar sputter target having differing crystallographic orientations in portions of the sputter target surface that promote more desirable deposition and density patterns of material sputtered from the target surface onto a substrate. A closed dome end of the sputter target is comprised of a first crystallographic orientation and sidewalls of the sputter target are comprised of a crystallographic orientation different from that of the dome. The sputter target is formed, preferably by hydroforming or other metal working techniques, in the absence of annealing. The hydroforming manipulations result in the different crystallographic orientations while minimizing, or ideally omitting, the application of heat. Quick and cost effective non-planar sputter targets that are easily repeatably producable are achievable as a result.
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