发明授权
US08040655B2 Substrate hold apparatus and method for judging substrate push-up state
有权
基板保持装置及判断基板上推状态的方法
- 专利标题: Substrate hold apparatus and method for judging substrate push-up state
- 专利标题(中): 基板保持装置及判断基板上推状态的方法
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申请号: US12021817申请日: 2008-01-29
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公开(公告)号: US08040655B2公开(公告)日: 2011-10-18
- 发明人: Zhao Weijiang , Ai Taura
- 申请人: Zhao Weijiang , Ai Taura
- 申请人地址: JP Kyoto
- 专利权人: Nissin Ion Equipment Co., Ltd.
- 当前专利权人: Nissin Ion Equipment Co., Ltd.
- 当前专利权人地址: JP Kyoto
- 代理机构: Osha • Liang LLP
- 优先权: JP2007-021021 20070131
- 主分类号: H01L21/683
- IPC分类号: H01L21/683
摘要:
A substrate hold apparatus is provided an electrostatic chuck for electrostatically attracting and holding a substrate thereon, a push-up member contactable with a position of vicinity of an edge of the substrate on the electrostatic chuck from below for pushing up the substrate, a drive apparatus for driving at least one of the electrostatic chuck and push-up member to thereby allow the push-up member to push up the substrate, a force sensor for detecting a force applied to the push-up member in an pushing-up operation, and a control unit wherein the control unit is configured to measure the force from the force sensor as a first measurement, output a normal state signal when the measured force in the first measurement is equal to or larger than a lower limit value and is equal to or smaller than a upper limit value.
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