Invention Grant
- Patent Title: Nonvolatile memory devices including oxygen-deficient metal oxide layers and methods of manufacturing the same
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Application No.: US12926042Application Date: 2010-10-22
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Publication No.: US08043926B2Publication Date: 2011-10-25
- Inventor: Sung-Il Cho , Choong-rae Cho , Eun-hong Lee , In-kyeong Yoo
- Applicant: Sung-Il Cho , Choong-rae Cho , Eun-hong Lee , In-kyeong Yoo
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, PLC
- Priority: KR10-2006-0045154 20060519
- Main IPC: H01L21/02
- IPC: H01L21/02

Abstract:
A nonvolatile memory device includes at least one switching device and at least one storage node electrically connected to the at least one switching device. The at least one storage node includes a lower electrode, one or more oxygen-deficient metal oxide layers, one or more data storage layers, and an upper electrode. At least one of the one or more metal oxide layers is electrically connected to the lower electrode. At least one of the one or more data storage layers is electrically connected to at least one of the one or more metal oxide layers. The upper electrode is electrically connected to at least one of the one or more data storage layers. A method of manufacturing the nonvolatile memory device includes preparing the at least one switching device and forming the lower electrode, one or more metal oxide layers, one or more data storage layers, and upper electrode.
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