Invention Grant
- Patent Title: Ultraviolet detecting device and manufacturing method thereof, and ultraviolet quantity measuring apparatus
- Patent Title (中): 紫外线检测装置及其制造方法以及紫外线量测定装置
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Application No.: US12915150Application Date: 2010-10-29
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Publication No.: US08044484B2Publication Date: 2011-10-25
- Inventor: Noriyuki Miura , Tadashi Chiba
- Applicant: Noriyuki Miura , Tadashi Chiba
- Applicant Address: JP Tokyo
- Assignee: Oki Semiconductor Co., Ltd.
- Current Assignee: Oki Semiconductor Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Volentine & Whitt, P.L.L.C.
- Priority: JP2007-089224 20070329
- Main IPC: H01L29/78
- IPC: H01L29/78

Abstract:
The present invention provides an ultraviolet detecting device which comprises a silicon semiconductor layer having a thickness ranging from greater than or equal to 3 nm to less than or equal to 36 nm, which is formed over an insulating layer, lateral PN-junction type first and second photodiodes formed in the silicon semiconductor layer, an interlayer insulating film formed over the silicon semiconductor layer, a first filter layer made of silicon nitride, which is formed over the interlayer insulating film provided over the first photodiode and causes light lying in a wavelength range of an UV-B wave or higher to pass therethrough, and a second filter layer made of silicon nitride, which is formed over the interlayer insulating film provided over the second photodiode and allows light lying in a wavelength range of an UV-A wave or higher to pass therethrough.
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