发明授权
US08045135B2 Lithographic apparatus with a fluid combining unit and related device manufacturing method
有权
具有流体组合单元和相关器件制造方法的平版印刷设备
- 专利标题： Lithographic apparatus with a fluid combining unit and related device manufacturing method
- 专利标题（中）： 具有流体组合单元和相关器件制造方法的平版印刷设备
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申请号： US11603255申请日： 2006-11-22
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公开(公告)号： US08045135B2公开(公告)日： 2011-10-25
- 发明人: Johannes Catharinus Hubertus Mulkens , Matthew Lipson , Harry Sewell , Louis John Markoya
- 申请人： Johannes Catharinus Hubertus Mulkens , Matthew Lipson , Harry Sewell , Louis John Markoya
- 申请人地址： NL Veldhoven NL Veldhoven
- 专利权人： ASML Netherlands B.V.,ASML Holding N.V.
- 当前专利权人： ASML Netherlands B.V.,ASML Holding N.V.
- 当前专利权人地址： NL Veldhoven NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; G03B27/42
摘要：
A system for tuning the refractive index of immersion liquid in an immersion lithographic apparatus is disclosed. Two or more immersion liquids of different refractive index are mixed together in order to achieve a desired refractive index. Further, the fluids may be conditioned and treated to maintain optical characteristics.
公开/授权文献
- US20080117392A1 Lithographic apparatus and device manufacturing method 公开/授权日：2008-05-22
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