Invention Grant
- Patent Title: Method of manufacturing nanoparticles
- Patent Title (中): 制造纳米粒子的方法
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Application No.: US11320707Application Date: 2005-12-30
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Publication No.: US08048192B2Publication Date: 2011-11-01
- Inventor: Thomas Pompilio Diaz , Samson Hettiarachchi , Peter Louis Andresen , Young Jin Kim
- Applicant: Thomas Pompilio Diaz , Samson Hettiarachchi , Peter Louis Andresen , Young Jin Kim
- Applicant Address: US NY Schenectady
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Schenectady
- Agency: Harness, Dickey & Pierce, P.L.C.
- Main IPC: B22F1/00
- IPC: B22F1/00

Abstract:
Provided are methods and systems for generating nanoparticles from an inorganic precursor compound using a hydrothermal process within at least one CSTR or PFR maintained at an elevated temperature and an elevated pressure and a treatment vessel in which this reaction solution can be applied to one or more catalyst substrates. In operation, the reaction solution may be maintained within the CSTR at a substantially constant concentration and within a reaction temperature range for a reaction period sufficient to obtain nanoparticles having a desired average particle size of, for example, less than 10 nm formation and/or deposition. Variations of the basic method and system can provide, for example, the generation of complex particle size distribution profiles, the selective deposition of a multi-modal particle size distribution on a single substrate.
Public/Granted literature
- US20070151418A1 Method of manufacturing nanoparticles Public/Granted day:2007-07-05
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