发明授权
- 专利标题: Method of manufacturing nanoparticles
- 专利标题(中): 制造纳米粒子的方法
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申请号: US11320707申请日: 2005-12-30
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公开(公告)号: US08048192B2公开(公告)日: 2011-11-01
- 发明人: Thomas Pompilio Diaz , Samson Hettiarachchi , Peter Louis Andresen , Young Jin Kim
- 申请人: Thomas Pompilio Diaz , Samson Hettiarachchi , Peter Louis Andresen , Young Jin Kim
- 申请人地址: US NY Schenectady
- 专利权人: General Electric Company
- 当前专利权人: General Electric Company
- 当前专利权人地址: US NY Schenectady
- 代理机构: Harness, Dickey & Pierce, P.L.C.
- 主分类号: B22F1/00
- IPC分类号: B22F1/00
摘要:
Provided are methods and systems for generating nanoparticles from an inorganic precursor compound using a hydrothermal process within at least one CSTR or PFR maintained at an elevated temperature and an elevated pressure and a treatment vessel in which this reaction solution can be applied to one or more catalyst substrates. In operation, the reaction solution may be maintained within the CSTR at a substantially constant concentration and within a reaction temperature range for a reaction period sufficient to obtain nanoparticles having a desired average particle size of, for example, less than 10 nm formation and/or deposition. Variations of the basic method and system can provide, for example, the generation of complex particle size distribution profiles, the selective deposition of a multi-modal particle size distribution on a single substrate.
公开/授权文献
- US20070151418A1 Method of manufacturing nanoparticles 公开/授权日:2007-07-05
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