Invention Grant
- Patent Title: Methods for implementing highly efficient plasma traps
- Patent Title (中): 实现高效等离子体阱的方法
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Application No.: US12504525Application Date: 2009-07-16
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Publication No.: US08048329B2Publication Date: 2011-11-01
- Inventor: Mohammad Kamarehi , Ing-Yann Albert Wang
- Applicant: Mohammad Kamarehi , Ing-Yann Albert Wang
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: IP Strategy Group, P.C.
- Main IPC: H01J27/00
- IPC: H01J27/00

Abstract:
A method for minimizing microwave leakage into processing chamber of a microwave plasma system is provided. The method includes securing plasma traps to a plasma tube assembly, which is a cylindrical structure positioned upstream from the processing chamber and has a plasma-sustaining region. The plasma traps are electrically conductive disks surrounding the cylindrical structure and are positioned upstream from the processing chamber. The plasma traps include at least two electrically conductive disks. Each electrically conductive disk includes corrugated outer surfaces with plurality of corrugated peaks. The corrugated outer surface of the first electrically conductive disk is facing a corrugated outer surface of the second electrically conductive disk in a space-apart relationship to form an interstitial region between the electrically conductive disks. Both electrically conductive disk and the interstitial region form one of a set of upstream plasma traps and a set of downstream plasma traps relative to the plasma-sustaining region.
Public/Granted literature
- US20090278054A1 METHODS FOR IMPLEMENTING HIGHLY EFFICIENT PLASMA TRAPS Public/Granted day:2009-11-12
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