发明授权
US08048776B2 Semiconductor device and method of supporting a wafer during backgrinding and reflow of solder bumps
有权
半导体器件和在焊料凸块的后研磨和回流期间支撑晶片的方法
- 专利标题: Semiconductor device and method of supporting a wafer during backgrinding and reflow of solder bumps
- 专利标题(中): 半导体器件和在焊料凸块的后研磨和回流期间支撑晶片的方法
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申请号: US12036000申请日: 2008-02-22
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公开(公告)号: US08048776B2公开(公告)日: 2011-11-01
- 发明人: Byung Tai Do , Heap Hoe Kuan , Yaojian Lin , Rui Huang
- 申请人: Byung Tai Do , Heap Hoe Kuan , Yaojian Lin , Rui Huang
- 申请人地址: SG Singapore
- 专利权人: STATS ChipPAC, Ltd.
- 当前专利权人: STATS ChipPAC, Ltd.
- 当前专利权人地址: SG Singapore
- 代理机构: Patent Law Group
- 代理商 Robert D. Atkins
- 主分类号: H01L21/30
- IPC分类号: H01L21/30
摘要:
A semiconductor device is made by providing a semiconductor wafer having an active surface, forming an under bump metallization layer on the active surface of the semiconductor wafer, forming a first photosensitive layer on the active surface of the semiconductor wafer, exposing a selected portion of the first photosensitive layer over the under bump metallization layer to light, removing a portion of a backside of the semiconductor wafer, opposite to the active surface, prior to developing the exposed portion of the first photosensitive layer, developing the exposed portion of the first photosensitive layer after removing the portion of the backside of the semiconductor wafer, and depositing solder material over the under bump metallization layer to form solder bumps. The remaining portion of the first photosensitive layer is then removed. A second photosensitive layer or metal stencil can be formed over the first photosensitive layer.
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