Invention Grant
- Patent Title: Image sensor
- Patent Title (中): 图像传感器
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Application No.: US12508312Application Date: 2009-07-23
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Publication No.: US08072038B2Publication Date: 2011-12-06
- Inventor: Tae Gyu Kim
- Applicant: Tae Gyu Kim
- Applicant Address: KR Seoul
- Assignee: Dongbu HiTek, Co., Ltd.
- Current Assignee: Dongbu HiTek, Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: The Law Offices of Andrew D. Fortney
- Agent Andrew D. Fortney; Sharon E. Brown Turner
- Priority: KR10-2008-0074162 20080729
- Main IPC: H01L27/14
- IPC: H01L27/14

Abstract:
An image sensor having greatly improved physical and electrical bonding forces between a photodiode and a substrate, and a manufacturing method thereof. The image sensor includes a semiconductor substrate and readout circuitry, a dielectric layer on the semiconductor substrate, a metal line in the dielectric layer, electrically connected with the readout circuitry, an image sensing device including first and second impurity regions on the dielectric layer, a via hole through the dielectric layer and the image sensing device, a hard mask in the via hole, and a lower electrode in the via hole to connect the first impurity region with the metal line.
Public/Granted literature
- US20100025800A1 Image Sensor and Manufacturing Method Thereof Public/Granted day:2010-02-04
Information query
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