发明授权
- 专利标题: Optical apparatus for use in photolithography
- 专利标题(中): 用于光刻的光学装置
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申请号: US10595469申请日: 2003-12-18
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公开(公告)号: US08072700B2公开(公告)日: 2011-12-06
- 发明人: Yim-Bun Patrick Kwan , Erik Loopstra
- 申请人: Yim-Bun Patrick Kwan , Erik Loopstra
- 申请人地址: DE Oberkochen NL Veldhoven
- 专利权人: Carl Zeiss SMT GmbH,ASML Netherlands B.V.
- 当前专利权人: Carl Zeiss SMT GmbH,ASML Netherlands B.V.
- 当前专利权人地址: DE Oberkochen NL Veldhoven
- 代理机构: CrayRobinson, P.A.
- 优先权: DE10350546 20031029
- 国际申请: PCT/EP03/14552 WO 20031218
- 国际公布: WO2005/050323 WO 20050602
- 主分类号: G02B7/02
- IPC分类号: G02B7/02
摘要:
An optical apparatus includes an interchange mechanism and an optical assembly of an illumination system or a projection objective. At least one of the plurality of optical elements of the optical assembly is selected from among a plurality of ones selectable from the interchange mechanism which facilitates exchange of one for another in the beam path. To reduce transmission of vibration from the interchange mechanism to the optical assembly, the interchange mechanism is mounted on a structure which is substantially dynamically decoupled from the housing, and a selected selectable optical element is located at an operating position at which it is separate from the interchange mechanism.
公开/授权文献
- US20070076184A1 Optical assembly for photolithography 公开/授权日:2007-04-05
信息查询
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B7/00 | 光学元件的安装、调整装置或不漏光连接 |
G02B7/02 | .用于透镜 |