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    Low-contamination optical arrangement
    3.
    发明授权
    Low-contamination optical arrangement 有权
    低污染光学布置

    公开(公告)号：US09316930B2

    公开(公告)日：2016-04-19

    申请号：US13023840

    申请日：2011-02-09

    申请人： Yim-Bun Patrick Kwan ,  Stefan Xalter

    发明人： Yim-Bun Patrick Kwan ,  Stefan Xalter

    IPC分类号： G03B27/54 ,  G03F7/20

    CPC分类号： G03F7/70916 ,  G03F7/70833 ,  G03F7/70883

    摘要： An optical arrangement has a plurality of optical elements capable of transmitting a beam. A partial housing is provided which extends from a surface of an optical element in the direction of the beam emanating from the optical element, or of the beam incident on the optical element, and whose shape is adapted to the shape of the beam. The partial housing is surrounded at least partially by a measurement structure which is mechanically decoupled therefrom. The measurement structure has at least one sensor.

    摘要翻译： 光学装置具有能够透射光束的多个光学元件。 提供了从光学元件的表面沿着从光学元件发射的光束的方向或入射在光学元件上的光束延伸的部分壳体，并且其形状适合于光束的形状。 至少部分地由部分壳体被与其机械分离的测量结构所包围。 测量结构具有至少一个传感器。

    Optical module for a microlithography objective including holding and supporting devices
    5.
    发明授权
    Optical module for a microlithography objective including holding and supporting devices 有权
    用于微光学目标的光学模块，包括保持和支撑装置

    公开(公告)号：US08711331B2

    公开(公告)日：2014-04-29

    申请号：US11597297

    申请日：2005-05-24

    申请人： Jens Kugler ,  Franz Sorg ,  Yim-Bun Patrick Kwan

    发明人： Jens Kugler ,  Franz Sorg ,  Yim-Bun Patrick Kwan

    IPC分类号： G03B27/70

    CPC分类号： G02B19/0023 ,  G02B7/00 ,  G02B7/021 ,  G02B7/023 ,  G02B7/026 ,  G02B7/182 ,  G02B17/0605 ,  G02B17/0615 ,  G03F7/70825

    摘要： There is provided an optical module for an objective. The optical module includes (a) a first holding device with an inner circumference, which extends in a first circumferential direction, (b) at least one first supporting device for supporting a first optical element and being fixed at said inner circumference of said first holding device, (c) an annular circumferential first assembly space being defined by displacing said first supporting device once in a revolving manner along said first circumferential direction, (d) at least one second supporting device being provided for supporting a second optical element and being fixed at said inner circumference of said first holding device, and (e) an annular circumferential second assembly space being defined by displacing said second supporting device once in a revolving manner along said first circumferential direction. The first assembly space intersects the second assembly space.

    摘要翻译： 提供了一种用于物镜的光学模块。 光学模块包括：（a）具有沿第一圆周方向延伸的内圆周的第一保持装置，（b）至少一个第一支撑装置，用于支撑第一光学元件并固定在所述第一保持件的所述内圆周 装置，（c）通过沿着所述第一圆周方向以旋转方式移动所述第一支撑装置来限定环形圆周第一组合空间;（d）至少一个第二支撑装置，用于支撑第二光学元件并被固定 在所述第一保持装置的所述内圆周处，以及（e）通过沿着所述第一圆周方向以旋转方式使所述第二支撑装置移动一次而限定的环形圆周第二组合空间。 第一组装空间与第二组装空间相交。

    Optical imaging device with determination of imaging errors
    6.
    发明授权
    Optical imaging device with determination of imaging errors 有权
    具有成像误差确定的光学成像装置

    公开(公告)号：US08587765B2

    公开(公告)日：2013-11-19

    申请号：US12158340

    申请日：2006-12-21

    申请人： Yim-Bun Patrick Kwan

    发明人： Yim-Bun Patrick Kwan

    IPC分类号： G03B27/54 ,  G03B27/68 ,  G03B27/42

    CPC分类号： G03F7/706 ,  G03F7/70591

    摘要： In some embodiments, the disclosure provides a system that includes an optical element group including a plurality of optical elements configured to project a pattern of an object in an object plane to an image plane. The system also includes a unit configured to detect an image selected from an image of at least part of the projection the pattern of the object, and an image of a measurement element arranged in the area of the object. The image is created via at least some of the optical elements in the optical element group. The unit is configured to determine an imaging error in the projection of the pattern of the object from the object plane to the image plane. The device is configured to be used in microlithography.

    摘要翻译： 在一些实施例中，本公开提供了一种系统，其包括光学元件组，该光学元件组包括被配置为将物体平面中的物体的图案投影到像平面的多个光学元件。 该系统还包括：被配置为检测从至少部分投影的图像中选择的图像的图像的图像以及布置在对象区域中的测量元素的图像的单元。 通过光学元件组中的至少一些光学元件创建图像。 该单元被配置为确定从对象平面到图像平面的物体的图案的投影中的成像误差。 该器件被配置为用于微光刻。

    Optical apparatus for use in photolithography
    7.
    发明授权
    Optical apparatus for use in photolithography 有权
    用于光刻的光学装置

    公开(公告)号：US08072700B2

    公开(公告)日：2011-12-06

    申请号：US10595469

    申请日：2003-12-18

    申请人： Yim-Bun Patrick Kwan ,  Erik Loopstra

    发明人： Yim-Bun Patrick Kwan ,  Erik Loopstra

    IPC分类号： G02B7/02

    CPC分类号： G03F7/70258 ,  G02B5/005 ,  G02B13/143 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/709

    摘要： An optical apparatus includes an interchange mechanism and an optical assembly of an illumination system or a projection objective. At least one of the plurality of optical elements of the optical assembly is selected from among a plurality of ones selectable from the interchange mechanism which facilitates exchange of one for another in the beam path. To reduce transmission of vibration from the interchange mechanism to the optical assembly, the interchange mechanism is mounted on a structure which is substantially dynamically decoupled from the housing, and a selected selectable optical element is located at an operating position at which it is separate from the interchange mechanism.

    摘要翻译： 一种光学设备包括一个交换机构和一个照明系统或投影物镜的光学组件。 光学组件的多个光学元件中的至少一个选自可从交换机构中选择的多个光学组件中的至少一个，其有助于在光束路径中彼此交换。 为了减少振动从互换机构到光学组件的传播，互换机构安装在基本上与壳体动态分离的结构上，并且所选择的可选择的光学元件位于与该壳体分离的操作位置 交换机制。

    Structure for use in a projection exposure system for manufacturing semiconductors
    8.
    发明授权
    Structure for use in a projection exposure system for manufacturing semiconductors 有权
    用于制造半导体的投影曝光系统的结构

    公开(公告)号：US07692881B2

    公开(公告)日：2010-04-06

    申请号：US10597872

    申请日：2005-02-22

    申请人： Yim-Bun Patrick Kwan ,  Bernhard Geuppert ,  Nico Kemper

    发明人： Yim-Bun Patrick Kwan ,  Bernhard Geuppert ,  Nico Kemper

    IPC分类号： G02B7/02

    CPC分类号： G02B7/02 ,  G03F7/70833

    摘要： A structure for mounting an assembly of optical elements disposed within a housing, in particular of a projection lens assembly of a projection exposure system for manufacturing semiconductor elements includes a plurality of supporting elements, each respective one of which forms part of a respective one of a plurality of connections though which the housing of the assembly is connected to said supporting structure through which the weight of the assembly is transferred to the supporting structure in such a way that supporting forces generated by said supporting structure are taken up by pressure forces and shear forces which act on at least one of the supporting elements.

    摘要翻译： 用于安装设置在壳体内的光学元件的组件的结构，特别是用于制造半导体元件的投影曝光系统的投影透镜组件包括多个支撑元件，每个支撑元件各自形成一个 多个连接件，其中组件的壳体连接到所述支撑结构，组件的重量通过所述支撑结构传递到支撑结构，使得由所述支撑结构产生的支撑力被压力和剪切力所吸收 其作用于至少一个支撑元件。