Invention Grant
US08080432B2 High performance MTJ element for STT-RAM and method for making the same
有权
用于STT-RAM的高性能MTJ元件和制作相同的方法
- Patent Title: High performance MTJ element for STT-RAM and method for making the same
- Patent Title (中): 用于STT-RAM的高性能MTJ元件和制作相同的方法
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Application No.: US12803190Application Date: 2010-06-21
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Publication No.: US08080432B2Publication Date: 2011-12-20
- Inventor: Cheng T. Horng , Ru-Ying Tong , Chyu-Jiuh Torng , Witold Kula
- Applicant: Cheng T. Horng , Ru-Ying Tong , Chyu-Jiuh Torng , Witold Kula
- Applicant Address: US CA Milpitas
- Assignee: MagIC Technologies, Inc.
- Current Assignee: MagIC Technologies, Inc.
- Current Assignee Address: US CA Milpitas
- Agency: Saile Ackerman LLC
- Agent Stephen B. Ackerman
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/336 ; H01L21/461
Abstract:
A method of forming a STT-MTJ MRAM cell that utilizes transfer of spin angular momentum as a mechanism for changing the magnetic moment direction of a free layer. The device includes an IrMn pinning layer, a SyAP pinned layer, a naturally oxidized, crystalline MgO tunneling barrier layer that is formed on an Ar-ion plasma smoothed surface of the pinned layer and, in one embodiment, a free layer that comprises an amorphous layer of Co60Fe20B20. of approximately 20 angstroms thickness formed between two crystalline layers of Fe of 3 and 6 angstroms thickness respectively. The free layer is characterized by a low Gilbert damping factor and by very strong polarizing action on conduction electrons. The resulting cell has a low critical current, a high dR/R and a plurality of such cells will exhibit a low variation of both resistance and pinned layer magnetization angular dispersion.
Public/Granted literature
- US20100261295A1 High performance MTJ element for STT-RAM and method for making the same Public/Granted day:2010-10-14
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