发明授权
- 专利标题: Method of grinding semiconductor wafers, grinding surface plate, and grinding device
- 专利标题(中): 研磨半导体晶圆,研磨面板和研磨装置的方法
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申请号: US12470714申请日: 2009-05-22
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公开(公告)号: US08092277B2公开(公告)日: 2012-01-10
- 发明人: Tomohiro Hashii , Yasunori Yamada , Yuichi Kakizono
- 申请人: Tomohiro Hashii , Yasunori Yamada , Yuichi Kakizono
- 申请人地址: JP Tokyo
- 专利权人: Sumco Corporation
- 当前专利权人: Sumco Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Greenblum & Bernstein P.L.C.
- 优先权: JP2008/140018 20080528
- 主分类号: B24B1/00
- IPC分类号: B24B1/00 ; B24B7/17
摘要:
A method of grinding semiconductor wafers including simultaneously grinding both surfaces of multiple semiconductor wafers by rotating the wafers between a pair of upper and lower rotating surface plates in a state where the wafers are held on a carrier so that centers of the wafers are positioned on a circumference of a single circle, wherein a ratio of an area of a circle passing through the centers of the wafers to an area of one of the wafers is greater than or equal to 1.33 but less than 2.0; surfaces of the fixed abrasive grains comprised in the surface plates are comprised of pellets disposed in a grid-like fashion, with the pellets provided in a center portion and pellets provided in a peripheral portion being larger in size than the pellets provided in an intermediate portion.