发明授权
US08093165B2 TiO2-containing silica glass and optical member for EUV lithography using the same
有权
含TiO 2的石英玻璃和使用其的EUV光刻的光学部件
- 专利标题： TiO2-containing silica glass and optical member for EUV lithography using the same
- 专利标题（中）： 含TiO 2的石英玻璃和使用其的EUV光刻的光学部件
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申请号： US12869035申请日： 2010-08-26
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公开(公告)号： US08093165B2公开(公告)日： 2012-01-10
- 发明人: Akio Koike , Yasutomi Iwahashi , Shinya Kikugawa , Yuko Tachibana
- 申请人： Akio Koike , Yasutomi Iwahashi , Shinya Kikugawa , Yuko Tachibana
- 申请人地址： JP Tokyo
- 专利权人： Asahi Glass Company, Limited
- 当前专利权人： Asahi Glass Company, Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权： JP2008-046267 20080227
- 主分类号： C03C3/06
- IPC分类号： C03C3/06 ; C03B19/06 ; C03B37/018 ; C03B25/00
摘要：
The present invention provides a TiO2—SiO2 glass in which when used as an optical member for an exposure tool for EUVL, a thermal expansion coefficient is substantially zero at the time of irradiation with high-EUV energy light, and physical properties of a multilayer can be kept over a long period of time by releasing hydrogen from the glass. The present invention relates to a TiO2-containing silica glass having a fictive temperature of 1,100° C. or lower, a hydrogen molecule concentration of 1×1016 molecules/cm3 or more, and a temperature, at which a linear thermal expansion coefficient is 0 ppb/° C., falling within the range of from 40 to 110° C.
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