发明授权
- 专利标题: Spectrometric analyzing device and spectrometric analyzing method
- 专利标题(中): 光谱分析装置和光谱分析方法
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申请号: US12310865申请日: 2007-12-21
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公开(公告)号: US08094308B2公开(公告)日: 2012-01-10
- 发明人: Takeshi Hasegawa
- 申请人: Takeshi Hasegawa
- 申请人地址: JP Tokyo
- 专利权人: Tokyo Institute of Technology
- 当前专利权人: Tokyo Institute of Technology
- 当前专利权人地址: JP Tokyo
- 代理机构: Wells St. John P.S.
- 优先权: JP2007-037051 20070216
- 国际申请: PCT/JP2007/001453 WO 20071221
- 国际公布: WO2008/099442 WO 20080821
- 主分类号: G01J4/00
- IPC分类号: G01J4/00
摘要:
A spectrometric analyzing device is capable of analyzing a thin film with high accuracy by using light having an arbitrary wavelength, such as not only infrared light but also visible light, ultraviolet light and X-ray, and using whatever refractive index of a supporting member of the thin film. A spectrometric analyzing device comprises a light source (1), a polarizing filter (2), a detection unit (3), a regression operation unit (4) and an absorbance spectrum calculation unit (5). The light source (1) emits light at n different angles of incidence (θn) to a measurement portion. The polarizing filter (2) shields an s-polarized component. The detection unit (3) detects transmitted spectra (S). The regression operation unit (4) uses the transmitted spectra (S) and a mixing ratio (R) to obtain an in-plane mode spectrum (sip) and an out-of-plane mode spectrum (sop) through a regression analysis. The absorbance spectrum calculation unit (5) calculates an in-plane mode absorbance spectrum (Aip) and an out-of-plane mode absorbance spectrum (Aop) of the thin film, based on the results from a state in which the thin film is on the supporting member and a state in which no thin film is on the supporting member.
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