发明授权
- 专利标题： Method of cleaning support plate
- 专利标题（中）： 清洁支撑板的方法
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申请号： US12837790申请日： 2010-07-16
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公开(公告)号： US08097087B2公开(公告)日： 2012-01-17
- 发明人: Tatsuhiro Mitake , Atsushi Miyanari , Yoshihiro Inao
- 申请人： Tatsuhiro Mitake , Atsushi Miyanari , Yoshihiro Inao
- 申请人地址： JP Kanagawa
- 专利权人： Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人： Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人地址： JP Kanagawa
- 代理机构： Wenderoth, Lind & Ponack, L.L.P.
- 优先权： JP2009-170012 20090721
- 主分类号： B08B5/00
- IPC分类号： B08B5/00
摘要：
A method of cleaning a support plate according to which, while no waste solution is produced after cleaning the support plate, the support plate can be treated at low cost. The method of cleaning the support plate includes the step of removing an organic substance adhered to the support plate by putting the support plate in contact with oxygen plasma.
公开/授权文献
- US20110017231A1 METHOD OF CLEANING SUPPORT PLATE 公开/授权日：2011-01-27
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