公开(公告)号：US08097087B2

公开(公告)日：2012-01-17

申请号：US12837790

申请日：2010-07-16

申请人： Tatsuhiro Mitake ,  Atsushi Miyanari ,  Yoshihiro Inao

发明人： Tatsuhiro Mitake ,  Atsushi Miyanari ,  Yoshihiro Inao

IPC分类号： B08B5/00

CPC分类号： B08B7/0035

摘要： A method of cleaning a support plate according to which, while no waste solution is produced after cleaning the support plate, the support plate can be treated at low cost. The method of cleaning the support plate includes the step of removing an organic substance adhered to the support plate by putting the support plate in contact with oxygen plasma.

摘要翻译： 一种清洁支撑板的方法，其中，在清洁支撑板之后不会产生废溶液的情况下，可以以低成本处理支撑板。 清洁支撑板的方法包括通过将支撑板与氧等离子体接触来去除附着到支撑板上的有机物质的步骤。

公开(公告)号：US20140141253A1

公开(公告)日：2014-05-22

申请号：US14127315

申请日：2012-05-31

申请人： Yasushi Fujii ,  Tatsuhiro Mitake ,  Atsushi Matsushita

发明人： Yasushi Fujii ,  Tatsuhiro Mitake ,  Atsushi Matsushita

IPC分类号： C23C16/50

CPC分类号： C23C16/50 ,  C23C16/26 ,  C23C16/505 ,  H01L21/0212 ,  H01L21/02274 ,  H01L21/6835 ,  H01L2221/68318 ,  H01L2221/68327 ,  H01L2221/68331 ,  H01L2221/6834 ,  H01L2221/68381 ,  Y10T428/31504

摘要： A method for forming a release layer which lies between a substrate and a supporting member and has a property that changes when the release layer absorbs light coming through the supporting member, by carrying out plasma CVD with a high-frequency power that is set so as to be higher than a power at which a mode jump occurs.

摘要翻译： 一种形成剥离层的方法，该剥离层位于基板和支撑构件之间，并且具有当剥离层吸收通过支撑构件的光时改变的性质，通过以设定为高的功率进行等离子体CVD 高于发生模式跳转的功率。

公开(公告)号：US20110265815A1

公开(公告)日：2011-11-03

申请号：US13086145

申请日：2011-04-13

申请人： Tatsuhiro MITAKE ,  Atsushi MATSUSHITA

发明人： Tatsuhiro MITAKE ,  Atsushi MATSUSHITA

IPC分类号： B08B7/00

CPC分类号： H01L21/67028 ,  B24C1/003 ,  B24C1/086 ,  B24C3/322 ,  H01L21/6835 ,  H01L21/6836 ,  H01L2221/68327 ,  H01L2221/6834

摘要： The present invention achieves a method of cleaning a support plate according to which, while no waste solution is produced after cleaning the support plate, the support plate can be treated at low cost. The method of cleaning the support plate includes the step of performing an organic substance and metal each adhered to the support plate by causing dry ice particle to hit the support plate, the support plate being a support plate from which a substrate has been stripped.

摘要翻译： 本发明实现了一种清洁支撑板的方法，根据该方法，在清洁支撑板之后不会产生废溶液，可以以低成本处理支撑板。 清洁支撑板的方法包括通过使干冰颗粒撞击支撑板来执行各自粘附到支撑板上的有机物质和金属的步骤，支撑板是从基板剥离的支撑板。

公开(公告)号：US20110017231A1

公开(公告)日：2011-01-27

申请号：US12837790

申请日：2010-07-16

申请人： Tatsuhiro MITAKE ,  Miyanari Atsushi ,  Inao Yoshihiro

发明人： Tatsuhiro MITAKE ,  Miyanari Atsushi ,  Inao Yoshihiro

IPC分类号： B08B7/00

CPC分类号： B08B7/0035

摘要： The present invention achieves a method of cleaning a support plate according to which, while no waste solution is produced after cleaning the support plate, the support plate can be treated at low cost. The method of cleaning the support plate includes the step of removing an organic substance adhered to the support plate by putting the support plate in contact with oxygen plasma.

摘要翻译： 本发明实现了一种清洁支撑板的方法，根据该方法，在清洁支撑板之后不会产生废溶液，可以以低成本处理支撑板。 清洁支撑板的方法包括通过将支撑板与氧等离子体接触来去除附着到支撑板上的有机物质的步骤。

公开(公告)号：US10094024B2

公开(公告)日：2018-10-09

申请号：US14127315

申请日：2012-05-31

申请人： Yasushi Fujii ,  Tatsuhiro Mitake ,  Atsushi Matsushita

发明人： Yasushi Fujii ,  Tatsuhiro Mitake ,  Atsushi Matsushita

IPC分类号： C23C16/50 ,  H01L21/02 ,  H01L21/683 ,  C23C16/26 ,  C23C16/505

摘要： A method for forming a release layer which lies between a substrate and a supporting member and has a property that changes when the release layer absorbs light coming through the supporting member, by carrying out plasma CVD with a high-frequency power that is set so as to be higher than a power at which a mode jump occurs.