Invention Grant
US08097483B2 Manufacturing a MEMS element having cantilever and cavity on a substrate
有权
在衬底上制造具有悬臂和空腔的MEMS元件
- Patent Title: Manufacturing a MEMS element having cantilever and cavity on a substrate
- Patent Title (中): 在衬底上制造具有悬臂和空腔的MEMS元件
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Application No.: US12682000Application Date: 2008-10-15
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Publication No.: US08097483B2Publication Date: 2012-01-17
- Inventor: Robertus T. F. Van Schaijk , Piebe Anne Zijlstra , Ronald Koster , Pieter Simon Van Dijk
- Applicant: Robertus T. F. Van Schaijk , Piebe Anne Zijlstra , Ronald Koster , Pieter Simon Van Dijk
- Applicant Address: DE Munich
- Assignee: Epcos AG
- Current Assignee: Epcos AG
- Current Assignee Address: DE Munich
- Agency: Nixon Peabody LLP
- Priority: EP07118429 20071015
- International Application: PCT/EP2008/063897 WO 20081015
- International Announcement: WO2009/050209 WO 20090423
- Main IPC: H01L21/00
- IPC: H01L21/00
Abstract:
Method for manufacturing a capacitor on a substrate, the capacitor including a first electrode (5) and a second electrode (12; 25), the first and second electrodes being separated by a cavity (16; 32), the substrate including an insulating surface layer (3), the first electrode (5) being arranged on the insulating surface layer a first metal body (7a; 20) being adjacent to the first electrode and arranged as anchor of the second electrode (12; 25) the second electrode being arranged as a beam-shaped body (12; 25) located on the first metal body and above the first electrode; the cavity (16; 32) being laterally demarcated by a sidewall of the first metal body.
Public/Granted literature
- US20100264498A1 MANUFACTURING A MEMS ELEMENT HAVING CANTILEVER AND CAVITY ON A SUBSTRATE Public/Granted day:2010-10-21
Information query
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