发明授权
- 专利标题： Resist composition and patterning process
- 专利标题（中）： 抗蚀剂组成和图案化工艺
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申请号： US12463751申请日： 2009-05-11
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公开(公告)号： US08101335B2公开(公告)日： 2012-01-24
- 发明人: Yuji Harada , Jun Hatakeyama , Kazunori Maeda , Koji Hasegawa , Satoshi Shinachi
- 申请人： Yuji Harada , Jun Hatakeyama , Kazunori Maeda , Koji Hasegawa , Satoshi Shinachi
- 申请人地址： JP Tokyo
- 专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址： JP Tokyo
- 代理机构： Birch, Stewart, Kolasch & Birch, LLP
- 优先权： JP2008-124476 20080512
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/30
摘要：
A copolymer of an alkali-soluble (α-trifluoromethyl)-acrylate and a norbornene derivative is useful as an additive to a resist composition. When processed by immersion lithography, the resist composition exhibits excellent water repellency and water slip and forms a pattern with few development defects.
公开/授权文献
- US20090280434A1 RESIST COMPOSITION AND PATTERNING PROCESS 公开/授权日：2009-11-12
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