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公开(公告)号：US20090280434A1
公开(公告)日：2009-11-12
申请号：US12463751
申请日：2009-05-11
申请人： Yuji HARADA , Jun Hatakeyama , Kazunori Maeda , Koji Hasegawa , Satoshi Shinachi
发明人： Yuji HARADA , Jun Hatakeyama , Kazunori Maeda , Koji Hasegawa , Satoshi Shinachi
CPC分类号： G03F7/0395 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041 , Y10S430/106 , Y10S430/111
摘要： A copolymer of an alkali-soluble (α-trifluoromethyl)-acrylate and a norbornene derivative is useful as an additive to a resist composition. When processed by immersion lithography, the resist composition exhibits excellent water repellency and water slip and forms a pattern with few development defects.
摘要翻译： 碱溶性（α-三氟甲基）丙烯酸酯和降冰片烯衍生物的共聚物可用作抗蚀剂组合物的添加剂。 当通过浸渍光刻处理时，抗蚀剂组合物表现出优异的防水性和水滑动性并且形成几乎没有显影缺陷的图案。
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公开(公告)号：US08101335B2
公开(公告)日：2012-01-24
申请号：US12463751
申请日：2009-05-11
申请人： Yuji Harada , Jun Hatakeyama , Kazunori Maeda , Koji Hasegawa , Satoshi Shinachi
发明人： Yuji Harada , Jun Hatakeyama , Kazunori Maeda , Koji Hasegawa , Satoshi Shinachi
CPC分类号： G03F7/0395 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041 , Y10S430/106 , Y10S430/111
摘要： A copolymer of an alkali-soluble (α-trifluoromethyl)-acrylate and a norbornene derivative is useful as an additive to a resist composition. When processed by immersion lithography, the resist composition exhibits excellent water repellency and water slip and forms a pattern with few development defects.
摘要翻译： 碱溶性（α-三氟甲基）丙烯酸酯和降冰片烯衍生物的共聚物可用作抗蚀剂组合物的添加剂。 当通过浸渍光刻处理时，抗蚀剂组合物表现出优异的防水性和水滑动性并且形成几乎没有显影缺陷的图案。
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公开(公告)号：US08431323B2
公开(公告)日：2013-04-30
申请号：US12608556
申请日：2009-10-29
申请人： Takeru Watanabe , Satoshi Shinachi , Takeshi Kinsho , Koji Hasegawa , Yuji Harada , Jun Hatakeyama , Kazunori Maeda , Tomohiro Kobayashi
发明人： Takeru Watanabe , Satoshi Shinachi , Takeshi Kinsho , Koji Hasegawa , Yuji Harada , Jun Hatakeyama , Kazunori Maeda , Tomohiro Kobayashi
CPC分类号： G03F7/11 , C07D307/04 , C07D307/77 , C07D315/00 , C07D319/06 , C08F14/18 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , C08F2/00
摘要： A fluorinated monomer of cyclic acetal structure has formula (1) wherein R is a C1-C20 alkyl group which may be substituted with halogen or separated by oxygen or carbonyl, and Z is a divalent organic group which forms a ring with alkylenoxy and contains a polymerizable unsaturated group. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water sliding property, lipophilicity, acid lability and hydrolyzability and is useful in formulating a protective coating composition and a resist composition.
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公开(公告)号：US08268528B2
公开(公告)日：2012-09-18
申请号：US12628794
申请日：2009-12-01
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/2041
摘要： A resist composition is provided comprising (A) an additive polymer of acyl-protected hexafluoroalcohol structure, (B) a base polymer having a structure derived from lactone ring, hydroxyl group and/or maleic anhydride, the base polymer becoming soluble in alkaline developer under the action of acid, (C) a photoacid generator, and (D) an organic solvent. The additive polymer is transparent to radiation of wavelength up to 200 nm, and its properties can be tailored by a choice of the polymer structure.
摘要翻译： 提供了抗蚀剂组合物，其包含（A）酰基保护的六氟醇结构的添加剂聚合物，（B）具有衍生自内酯环，羟基和/或马来酸酐的结构的基础聚合物，所述基础聚合物在碱性显影剂中变得可溶 酸的作用，（C）光致酸发生剂，和（D）有机溶剂。 添加剂聚合物对波长高达200nm的辐射是透明的，并且其性质可以通过选择聚合物结构来定制。
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公开(公告)号：US20100136482A1
公开(公告)日：2010-06-03
申请号：US12628794
申请日：2009-12-01
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/2041
摘要： A resist composition is provided comprising (A) an additive polymer of acyl-protected hexafluoroalcohol structure, (B) a base polymer having a structure derived from lactone ring, hydroxyl group and/or maleic anhydride, the base polymer becoming soluble in alkaline developer under the action of acid, (C) a photoacid generator, and (D) an organic solvent. The additive polymer is transparent to radiation of wavelength up to 200 nm, and its properties can be tailored by a choice of the polymer structure.
摘要翻译： 提供了抗蚀剂组合物，其包含（A）酰基保护的六氟醇结构的添加剂聚合物，（B）具有衍生自内酯环，羟基和/或马来酸酐的结构的基础聚合物，所述基础聚合物在碱性显影剂中变得可溶 酸的作用，（C）光致酸发生剂，和（D）有机溶剂。 添加剂聚合物对波长高达200nm的辐射是透明的，并且其性质可以通过选择聚合物结构来定制。
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公开(公告)号：US08252504B2
公开(公告)日：2012-08-28
申请号：US12371455
申请日：2009-02-13
CPC分类号： G03F7/0046 , C08F220/18 , C08F220/24 , C08F220/28 , G03F7/0392 , G03F7/0397
摘要： A polymer obtained through copolymerization of a monomer having a hexafluoroalcohol pendant whose hydroxyl moiety has been protected and a monomer having an acid labile group is useful as an additive to a photoresist composition for immersion lithography. When processed by immersion lithography, the resist composition exhibits good water repellency and water slip and produces few development defects.
摘要翻译： 通过使具有羟基部分被保护的六氟醇侧基的单体和具有酸不稳定基团的单体的共聚合得到的聚合物可用作浸渍光刻用光致抗蚀剂组合物的添加剂。 当通过浸渍光刻处理时，抗蚀剂组合物表现出良好的拒水性和水滑动，并且产生很少的显影缺陷。
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公开(公告)号：US20090208873A1
公开(公告)日：2009-08-20
申请号：US12371455
申请日：2009-02-13
IPC分类号： G03F7/20 , C08F118/02 , G03F7/039
CPC分类号： G03F7/0046 , C08F220/18 , C08F220/24 , C08F220/28 , G03F7/0392 , G03F7/0397
摘要： A polymer obtained through copolymerization of a monomer having a hexafluoroalcohol pendant whose hydroxyl moiety has been protected and a monomer having an acid labile group is useful as an additive to a photoresist composition for immersion lithography. When processed by immersion lithography, the resist composition exhibits good water repellency and water slip and produces few development defects.
摘要翻译： 通过使具有羟基部分被保护的六氟醇侧基的单体和具有酸不稳定基团的单体的共聚合得到的聚合物可用作浸渍光刻用光致抗蚀剂组合物的添加剂。 当通过浸渍光刻处理时，抗蚀剂组合物表现出良好的拒水性和水滑动，并且产生很少的显影缺陷。
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8.发明授权Resist composition, resist protective coating composition, and patterning process 有权抗蚀剂组合物，抗蚀保护涂料组合物和图案化工艺公开(公告)号：US08057981B2
公开(公告)日：2011-11-15
申请号：US12371347
申请日：2009-02-13
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041 , Y10S430/108 , Y10S430/111 , Y10S430/143
摘要： A polymer obtained through copolymerization of a monomer having a hexafluoroalcohol pendant and a monomer having a hexafluoroalcohol pendant whose hydroxyl moiety has been protected is useful as an additive to a photoresist composition and as a protective coating material for immersion lithography. When processed by immersion lithography, the resist composition and protective coating composition exhibit good water repellency and water slip and produce few development defects.
摘要翻译： 通过具有六氟醇侧基的单体和具有羟基部分被保护的六氟醇侧基的单体共聚得到的聚合物可用作光致抗蚀剂组合物的添加剂和浸渍光刻用保护涂料。 当通过浸渍光刻处理时，抗蚀剂组合物和保护涂层组合物表现出良好的防水性和水滑动性，并且产生很少的显影缺陷。
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9.发明申请Resist Composition, Resist Protective Coating Composition, and Patterning Process 有权抗蚀剂组合物，抗蚀保护涂料组合物和图案化方法公开(公告)号：US20090208867A1
公开(公告)日：2009-08-20
申请号：US12371347
申请日：2009-02-13
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041 , Y10S430/108 , Y10S430/111 , Y10S430/143
摘要： A polymer obtained through copolymerization of a monomer having a hexafluoroalcohol pendant and a monomer having a hexafluoroalcohol pendant whose hydroxyl moiety has been protected is useful as an additive to a photoresist composition and as a protective coating material for immersion lithography. When processed by immersion lithography, the resist composition and protective coating composition exhibit good water repellency and water slip and produce few development defects.
摘要翻译： 通过具有六氟醇侧基的单体和具有羟基部分被保护的六氟醇侧基的单体共聚得到的聚合物可用作光致抗蚀剂组合物的添加剂和浸渍光刻用保护涂料。 当通过浸渍光刻处理时，抗蚀剂组合物和保护性涂料组合物表现出良好的拒水性和水滑动性，并且产生很少的显影缺陷。
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10.发明授权Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process 有权磺酰基重氮甲烷，光酸产生剂，抗蚀剂组合物和图案化工艺公开(公告)号：US06713612B2
公开(公告)日：2004-03-30
申请号：US10426623
申请日：2003-05-01
申请人： Katsuhiro Kobayashi , Youichi Ohsawa , Koji Hasegawa , Takao Yoshihara , Kazunori Maeda , Toshihiko Fujii
发明人： Katsuhiro Kobayashi , Youichi Ohsawa , Koji Hasegawa , Takao Yoshihara , Kazunori Maeda , Toshihiko Fujii
IPC分类号： C07C24514
CPC分类号： G03F7/0382 , C07C317/28 , G03F7/0045 , G03F7/0392
摘要： Sulfonyldiazomethane compounds containing a long-chain alkylcyclohexyl group are novel and useful as photoacid generators. Chemical amplification type resist compositions comprising the same are suited for microfabrication because of many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development.
摘要翻译： 含有长链烷基环己基的磺酰基重氮甲烷化合物是新颖的，可用作光致酸发生剂。 包含该化合物的化学放大型抗蚀剂组合物由于包括改进的分辨率，改善的聚焦纬度，最小化的线宽变化或最小化的线宽变化或形状退化，甚至在长时间的PED，最小的残留在涂层，显影和剥离之后的碎片以及改进的许多优点也适用于微细加工。 开发后的图案样式。
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