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US08101511B2 Method of manufacturing a junction barrier Schottky diode with dual silicides 有权
制造具有双重硅化物的结屏障肖特基二极管的方法

Method of manufacturing a junction barrier Schottky diode with dual silicides
摘要:
An integrated circuit, including a junction barrier Schottky diode, has an N type well, a P-type anode region in the surface of the well, and an N-type Schottky region in the surface of the well and horizontally abutting the anode region. A first silicide layer is on and makes a Schottky contact to the Schottky region and is on an adjoining anode region. A second silicide layer of a different material than the first silicide is on the anode region. An ohmic contact is made to the second silicide on the anode region and to the well.
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