Invention Grant
- Patent Title: Waveguide element and method of production thereof
- Patent Title (中): 波导元件及其制造方法
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Application No.: US12558962Application Date: 2009-09-14
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Publication No.: US08107778B2Publication Date: 2012-01-31
- Inventor: Takashi Kikuchi , Roshan Thapliya , Shigetoshi Nakamura
- Applicant: Takashi Kikuchi , Roshan Thapliya , Shigetoshi Nakamura
- Applicant Address: JP Tokyo
- Assignee: Fuji Xerox Co., Ltd.
- Current Assignee: Fuji Xerox Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2009-055659 20090309
- Main IPC: G02B6/12
- IPC: G02B6/12 ; G02B6/26

Abstract:
There is provided a method of producing a waveguide element comprising steps of forming a lower cladding layer having a refractive index n1 on a substrate having a lower electrode; forming an active core layer having a refractive index n2 and exhibiting an electro-optical effect on a surface of the lower cladding layer; forming a protective layer having a reflective index n4 on a surface of the active core layer; forming a passive core layer having a reflective index n3 on a surface of the protective layer; exposing the passive core layer with a predetermined pattern to form an optical circuit; forming an upper cladding layer on a surface of the passive core layer; forming an upper electrode on a surface of the upper cladding layer; and performing a polarization orientation treatment in which the active core layer is softened or liquidized and cured while the electric field is applied.
Public/Granted literature
- US20100226605A1 WAVEGUIDE ELEMENT AND METHOD OF PRODUCTION THEREOF Public/Granted day:2010-09-09
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