发明授权
- 专利标题: Short path customized mask correction
- 专利标题(中): 短路定制掩码校正
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申请号: US12355814申请日: 2009-01-19
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公开(公告)号: US08108804B2公开(公告)日: 2012-01-31
- 发明人: Ioana Graur , Scott M. Mansfield
- 申请人: Ioana Graur , Scott M. Mansfield
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理商 Yuanmin Cai
- 主分类号: G06F17/50
- IPC分类号: G06F17/50
摘要:
Embodiments of the present invention provide a method of performing photo-mask correction. The method includes identifying a hot-spot in a photo-mask that violates one or more predefined rules; creating a window area in the photo-mask that surrounds the hot spot; categorizing the window area; selecting a solution, from a library of pre-computed solutions, based on a category of the window area; and applying the solution to the hot spot. A service-oriented architecture (SOA) system that synchronizes the design to the process is also provided.
公开/授权文献
- US20100185999A1 SHORT PATH CUSTOMIZED MASK CORRECTION 公开/授权日:2010-07-22
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