发明授权
- 专利标题: Method for producing a thin-film solar cell by use of microcrystalline silicon and a layer sequence
- 专利标题(中): 通过使用微晶硅和层序来制造薄膜太阳能电池的方法
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申请号: US11793690申请日: 2005-12-13
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公开(公告)号: US08110246B2公开(公告)日: 2012-02-07
- 发明人: Stefan Klein , Yaohua Mai , Friedhelm Finger , Reinhard Carius
- 申请人: Stefan Klein , Yaohua Mai , Friedhelm Finger , Reinhard Carius
- 申请人地址: DE Julich
- 专利权人: Forschungszentrum Julich GmbH
- 当前专利权人: Forschungszentrum Julich GmbH
- 当前专利权人地址: DE Julich
- 代理商 Jonathan Myers; Andrew Wilford
- 优先权: DE102004061360 20041221
- 国际申请: PCT/DE2005/002237 WO 20051213
- 国际公布: WO2006/066544 WO 20060629
- 主分类号: H01L31/028
- IPC分类号: H01L31/028
摘要:
The invention relates to a method for production of a thin-layer solar cell with microcrystalline silicon and a layer sequence. According to the invention, a microcrystalline silicon layer is applied to the lower p- or n-layer in pin or nip thin-layer solar cells, by means of a HWCVD method before the application of the microcrystalline i-layer. The efficiency of the solar cell is hence increased by up to 0.8% absolute.