Invention Grant
US08114216B2 Semiconductor single crystal growth method having improvement in oxygen concentration characteristics 有权
具有氧浓度特性改善的半导体单晶生长方法

Semiconductor single crystal growth method having improvement in oxygen concentration characteristics
Abstract:
The present invention relates to a semiconductor single crystal growth method, which uses a Czochralski process for growing a semiconductor single crystal through a solid-liquid interface by dipping a seed into a semiconductor melt received in a quartz crucible and pulling up the seed while rotating the quartz crucible and applying a strong horizontal magnetic field, wherein the seed is pulled up while the quartz crucible is rotated with a rate between 0.6 rpm and 1.5 rpm.
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