Invention Grant
- Patent Title: Grid-line-free contact for a photovoltaic cell
- Patent Title (中): 光伏电池的无栅极接触
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Application No.: US12621685Application Date: 2009-11-19
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Publication No.: US08115097B2Publication Date: 2012-02-14
- Inventor: Supratik Guha , Yves Martin , Naim Moumen , Robert L. Sandstrom , Theodore G. van Kessel
- Applicant: Supratik Guha , Yves Martin , Naim Moumen , Robert L. Sandstrom , Theodore G. van Kessel
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent Vazken Alexanian
- Main IPC: H01L31/18
- IPC: H01L31/18 ; H01L31/00

Abstract:
Electrical contact to the front side of a photovoltaic cell is provided by an array of conductive through-substrate vias, and optionally, an array of conductive blocks located on the front side of the photovoltaic cell. A dielectric liner provides electrical isolation of each conductive through-substrate via from the semiconductor material of the photovoltaic cell. A dielectric layer on the backside of the photovoltaic cell is patterned to cover a contiguous region including all of the conductive through-substrate vias, while exposing a portion of the backside of the photovoltaic cell. A conductive material layer is deposited on the back surface of the photovoltaic cell, and is patterned to form a first conductive wiring structure that electrically connects the conductive through-substrate vias and a second conductive wiring structure that provides electrical connection to the backside of the photovoltaic cell.
Public/Granted literature
- US20100218816A1 GRID-LINE-FREE CONTACT FOR A PHOTOVOLTAIC CELL Public/Granted day:2010-09-02
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