Solar concentrator cooling by vortex gas circulation
    2.
    发明授权
    Solar concentrator cooling by vortex gas circulation 有权
    太阳能集中器通过涡流气体循环冷却

    公开(公告)号:US08941000B2

    公开(公告)日:2015-01-27

    申请号:US13365306

    申请日:2012-02-03

    IPC分类号: H01L31/052

    摘要: A convective method is employed to cool a solar concentrator device. The convective method employs formation of a vortex gas circulation inside an enclosure of the solar concentrator device, which is bounded by at least one light-path altering component, sidewalls, and a back panel. Optionally, a heat sink assembly can be provided within the enclosure. Internal convention through the vortex gas circulation transfers the heat generated at a photovoltaic cell to all surfaces of the solar concentrator device to facilitate radiative and/or convective cooling at the outside surfaces of the enclosure.

    摘要翻译: 采用对流方法来冷却太阳能集中器装置。 对流方法采用在太阳能集中器装置的外壳内形成涡流气体循环,太阳能集中器装置由至少一个光路改变部件,侧壁和后面板限定。 可选地,可以在外壳内提供散热器组件。 通过涡流气体循环的内部惯例将在光伏电池处产生的热量转移到太阳能集中器装置的所有表面,以便于在外壳的外表面处进行辐射和/或对流冷却。

    Solar concentration system
    5.
    发明授权
    Solar concentration system 有权
    太阳能集中系统

    公开(公告)号:US08026439B2

    公开(公告)日:2011-09-27

    申请号:US12622504

    申请日:2009-11-20

    IPC分类号: H01L31/00

    摘要: A solar concentration system includes an optically clear shell member having an outer surface and an inner surface, with the inner surface defining a hollow interior portion, a liquid contained within the hollow interior portion of the optically clear shell, and a solar collection system contained within the hollow interior portion of the optically clear shell. The solar collection system includes a tracking system configured and disposed to selectively shift within the hollow interior portion, a reflector member mounted to the tracking system, and a solar receiver mounted to the tracking system. The tracking system being configured and disposed orient the reflector member and the solar receiver to follow a path of the sun enhancing the collection of solar energy.

    摘要翻译: 太阳能集中系统包括具有外表面和内表面的光学透明壳体构件,其中内表面限定中空内部部分,容纳在光学透明壳体的中空内部部分内的液体以及包含在其中的太阳能收集系统 光学透明外壳的中空内部。 太阳能收集系统包括配置和设置成在中空内部部分内有选择地移动的跟踪系统,安装到跟踪系统的反射器部件和安装到跟踪系统的太阳能接收器。 跟踪系统被配置和布置成使得反射器构件和太阳能接收器沿着太阳能路径收集太阳能。

    Methods for forming improved self-assembled patterns of block copolymers
    9.
    发明授权
    Methods for forming improved self-assembled patterns of block copolymers 有权
    形成改进的嵌段共聚物自组装图案的方法

    公开(公告)号:US07347953B2

    公开(公告)日:2008-03-25

    申请号:US11345812

    申请日:2006-02-02

    IPC分类号: B44C1/22

    摘要: A method for forming self-assembled patterns on a substrate surface is provided. First, a block copolymer layer, which comprises a block copolymer having two or more immiscible polymeric block components, is applied onto a substrate that comprises a substrate surface with a trench therein. The trench specifically includes at least one narrow region flanked by two wide regions, and wherein the trench has a width variation of more than 50%. Annealing is subsequently carried out to effectuate phase separation between the two or more immiscible polymeric block components in the block copolymer layer, thereby forming periodic patterns that are defined by repeating structural units. Specifically, the periodic patterns at the narrow region of the trench are aligned in a predetermined direction and are essentially free of defects. Block copolymer films formed by the above-described method as well as semiconductor structures comprising such block copolymer films are also described.

    摘要翻译: 提供了一种在衬底表面上形成自组装图案的方法。 首先,将包含具有两个或更多个不混溶的聚合物嵌段组分的嵌段共聚物的嵌段共聚物层施加到包含其中具有沟槽的衬底表面的衬底上。 沟槽具体包括至少一个两个宽的区域的窄区域,并且其中沟槽具有大于50%的宽度变化。 随后进行退火以实现嵌段共聚物层中的两种或更多种不混溶的聚合物嵌段组分之间的相分离,从而形成由重复结构单元定义的周期性图案。 具体地说,在沟槽的窄区域的周期性图案在预定方向上排列,并且基本上没有缺陷。 还描述了通过上述方法形成的嵌段共聚物膜以及包含这种嵌段共聚物膜的半导体结构。

    Thickness control of semiconductor device layers in reactive ion etch
processes
    10.
    发明授权
    Thickness control of semiconductor device layers in reactive ion etch processes 失效
    反应离子蚀刻工艺中半导体器件层的厚度控制

    公开(公告)号:US5882468A

    公开(公告)日:1999-03-16

    申请号:US804600

    申请日:1997-02-24

    IPC分类号: H01L21/00 C23F1/02

    CPC分类号: H01L21/67069

    摘要: By moving a substrate relative to a shadow mask in a reactive ion etching system, we are able to precisely tailor the thickness of critical layers. To minimize disturbing the plasma, all the mechanical components are kept below the anode. The system is highly reproducible, and can be programmed to yield arbitrary vertical profiles along one horizontal axis. Using silicon-on-insulator substrates, the resonance wavelength was modified as a function of position with better than 1 nm control in the vertical dimension. This technique should prove useful for optical devices where the thickness of the layers controls the device characteristics.

    摘要翻译: 通过在反应离子蚀刻系统中相对于荫罩移动衬底,我们能够精确地定制临界层的厚度。 为了最小化扰乱等离子体,所有机械部件都保持在阳极下方。 该系统具有高度的可重复性,并且可以编程为沿着一个水平轴产生任意垂直剖面。 使用绝缘体上硅衬底,谐振波长作为垂直尺寸控制优于1nm的位置的函数进行了修改。 该技术对于其中层的厚度控制器件特性的光学器件应该是有用的。