Invention Grant
- Patent Title: Method for forming an embossed holographic pattern
- Patent Title (中): 用于形成压花全息图案的方法
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Application No.: US12301185Application Date: 2007-12-05
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Publication No.: US08118960B2Publication Date: 2012-02-21
- Inventor: Bo Wu , Qiming Jin , Qing Gong
- Applicant: Bo Wu , Qiming Jin , Qing Gong
- Applicant Address: CN Shenzhen
- Assignee: BYD Co., Ltd.
- Current Assignee: BYD Co., Ltd.
- Current Assignee Address: CN Shenzhen
- Agency: Brinks Hofer Gilson & Lione
- Priority: CN200610157479 20061212
- International Application: PCT/CN2007/071181 WO 20071205
- International Announcement: WO2008/071114 WO 20080619
- Main IPC: B32B37/02
- IPC: B32B37/02 ; B41M5/025 ; B01J19/08

Abstract:
A method for forming an embossed holographic pattern comprises the following steps: A. recording the required pattern onto a photo-sensitive plate by means of laser holography to produce an optical mask plate for the holographic pattern; B. duplicating the laser holographic information on the optical mask plate onto a metal plate, to produce a metal plate for the holographic pattern; C. transferring the laser holographic pattern on the metal plate onto an information layer on a water soluble film, to form an embossed holographic water transfer printing film; D. carrying out a cubic water transfer printing on the surface of a base material by using the embossed holographic water transfer printing film, to form the holographic pattern on the surface of the base material. With the method for forming the embossed holographic pattern according to the present invention, a holographic pattern can be formed on the surface of work-piece having a complex shape.
Public/Granted literature
- US20100000668A1 METHOD FOR FORMING AN EMBOSSED HOLOGRAPHIC PATTERN Public/Granted day:2010-01-07
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