发明授权
- 专利标题： Electroplated magnetic film for read-write applications
- 专利标题（中）： 用于读写应用的电镀磁膜
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申请号： US11431261申请日： 2006-05-10
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公开(公告)号： US08118990B2公开(公告)日： 2012-02-21
- 发明人: Xiaomin Liu , Feiyue Li , Cherng-Chyi Han
- 申请人： Xiaomin Liu , Feiyue Li , Cherng-Chyi Han
- 申请人地址： US CA Milpitas
- 专利权人： Headway Technologies, Inc.
- 当前专利权人： Headway Technologies, Inc.
- 当前专利权人地址： US CA Milpitas
- 代理机构： Saile Ackerman LLC
- 代理商 Stephen B. Ackerman
- 主分类号： C25D3/56
- IPC分类号： C25D3/56
摘要：
A process is described for the fabrication, through electrodeposition, of FexCoyNiz (x=60-71, y=25-35, z=0-5) films that have, in their as-deposited form, a saturation magnetization of at least 24 kG and a coercivity of less than 0.3 Oe. A key feature is the addition of aryl sulfinates to the plating bath along with a suitable seed layer.
公开/授权文献
- US20070261967A1 Electroplated magnetic film for read-write applications 公开/授权日：2007-11-15
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