发明授权
- 专利标题： Lithographic method
- 专利标题（中）： 平版印刷法
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申请号： US12186959申请日： 2008-08-06
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公开(公告)号： US08119333B2公开(公告)日： 2012-02-21
- 发明人: Eddy Cornelis Antonius Van Der Heijden , Johannes Anna Quaedackers , Dorothea Maria Christina Oorschot , Hieronymus Johannus Christiaan Meessen , Yin Fong Choi
- 申请人： Eddy Cornelis Antonius Van Der Heijden , Johannes Anna Quaedackers , Dorothea Maria Christina Oorschot , Hieronymus Johannus Christiaan Meessen , Yin Fong Choi
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 主分类号： G03F7/26
- IPC分类号： G03F7/26
摘要：
A method for providing a pattern on a substrate is disclosed. The method includes providing a first pattern in a first layer of photoresist and a first layer of bottom anti-reflective coating material on the substrate, etching the first pattern into the substrate, providing a second layer of photoresist and a second layer of bottom anti-reflective coating material on the substrate, providing a second pattern in the second layers of photoresist and bottom anti-reflective coating material, and etching the second pattern into the substrate, the first and second patterns on the substrate together defining the pattern.
公开/授权文献
- US20090148796A1 Lithographic Method 公开/授权日：2009-06-11
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