Invention Grant
- Patent Title: Inspection apparatus
- Patent Title (中): 检验仪器
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Application No.: US12506421Application Date: 2009-07-21
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Publication No.: US08120766B2Publication Date: 2012-02-21
- Inventor: Yoshimasa Oshima , Yuta Urano , Toshiyuki Nakao
- Applicant: Yoshimasa Oshima , Yuta Urano , Toshiyuki Nakao
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2008-231640 20080910
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
Scattered light that originates from the surface roughness of silicon or other metallic films is distributed more strongly at positions closer to the starting position of the scattering. Of all scattered-light detection signals obtained during multi-directional detection, therefore, only a detection signal of forward scattered light can be used to detect micro-defects, and only a detection signal of backward scattered light can be used to detect the surface roughness very accurately.
Public/Granted literature
- US20100060895A1 Inspection Apparatus Public/Granted day:2010-03-11
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